Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
19370 | 444 | 18.1 | 60% |
Classes in level above (level 2) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
138 | 22619 | IEEE TRANSACTIONS ON ELECTRON DEVICES//IEEE ELECTRON DEVICE LETTERS//SOLID-STATE ELECTRONICS |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | SINGLE EVENT BURNOUT SEB | Author keyword | 72 | 100% | 5% | 23 |
2 | SINGLE EVENT GATE RUPTURE SEGR | Author keyword | 56 | 100% | 4% | 19 |
3 | RREACT GRP | Address | 33 | 77% | 5% | 23 |
4 | SINGLE EVENT BURNOUT | Author keyword | 23 | 70% | 4% | 19 |
5 | ION ELECTRON EMISSION MICROSCOPY | Author keyword | 19 | 80% | 3% | 12 |
6 | SEGR | Author keyword | 15 | 68% | 3% | 13 |
7 | FLOATING GATE MEMORIES | Author keyword | 9 | 67% | 2% | 8 |
8 | SINGLE EVENT GATE RUPTURE | Author keyword | 7 | 56% | 2% | 9 |
9 | ION PHOTON EMISSION MICROSCOPY | Author keyword | 6 | 80% | 1% | 4 |
10 | FLOATING GATE FG MEMORIES | Author keyword | 6 | 100% | 1% | 4 |
Web of Science journal categories |
Author Key Words |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | SEGR | 32 | 78% | 5% | 21 |
2 | SINGLE EVENT BURNOUT | 27 | 66% | 6% | 25 |
3 | EVENT GATE RUPTURE | 20 | 62% | 5% | 21 |
4 | THIN GATE OXIDES | 13 | 35% | 7% | 31 |
5 | INDUCED SOFT BREAKDOWN | 11 | 78% | 2% | 7 |
6 | INDUCED LEAKAGE CURRENT | 9 | 18% | 11% | 48 |
7 | VERTICAL POWER MOSFETS | 9 | 64% | 2% | 9 |
8 | BACKSIDE LASER | 9 | 83% | 1% | 5 |
9 | FLOATING GATE MEMORIES | 9 | 83% | 1% | 5 |
10 | SIRAD | 9 | 83% | 1% | 5 |
Journals |
Reviews |
Title | Publ. year | Cit. | Active references |
% act. ref. to same field |
---|---|---|---|---|
Present and Future Non-Volatile Memories for Space | 2010 | 41 | 98 | 44% |
Soft errors in floating gate memory cells: A review | 2015 | 0 | 13 | 85% |
A review of ionizing radiation effects in floating gate memories | 2004 | 19 | 46 | 30% |
Production testing and quality assurance of CMS silicon microstrip tracker readout chips | 2005 | 3 | 6 | 17% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | RREACT GRP | 33 | 77% | 5.2% | 23 |
2 | RD TECHNOL DEV | 3 | 30% | 2.0% | 9 |
3 | FTM ADV RD | 2 | 44% | 0.9% | 4 |
4 | STMICROELECT M6 | 2 | 67% | 0.5% | 2 |
5 | RADIAT SOLID INTERACT PROC 1111 | 1 | 40% | 0.5% | 2 |
6 | DEV TECHNOL DEV | 1 | 50% | 0.2% | 1 |
7 | DIPARTIMENTO INFN INFORMAZ | 1 | 50% | 0.2% | 1 |
8 | ELECT MAT ENGN ELECT | 1 | 50% | 0.2% | 1 |
9 | IES UMR CNRS 5214 UM2 | 1 | 50% | 0.2% | 1 |
10 | STI IEL E | 1 | 50% | 0.2% | 1 |
Related classes at same level (level 1) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000233971 | OXIDE TRAPPED CHARGE//ELDRS//TOTAL IONIZING DOSE |
2 | 0.0000187183 | SINGLE EVENT UPSET SEU//SINGLE EVENT UPSET//SINGLE EVENT TRANSIENT |
3 | 0.0000122208 | RADIATION INDUCED CHARGES//AF IOFFE PTI//RETAINED POLARIZATION |
4 | 0.0000121180 | STRESS INDUCED LEAKAGE CURRENT//SOFT BREAKDOWN//DIELECTRIC BREAKDOWN BD |
5 | 0.0000101563 | RADFET//IMPLANTABLE DOSIMETER//DEVICE PHYS MICROELECT |
6 | 0.0000083129 | SONOS//CHARGE TRAPPING LAYER//FLASH MEMORY |
7 | 0.0000058864 | GAS FILLED SURGE ARRESTERS//BREAKDOWN TIME DELAY//AFTERGLOW PERIOD |
8 | 0.0000047563 | INSULATED GATE BIPOLAR TRANSISTOR IGBT//LATERAL INSULATED GATE BIPOLAR TRANSISTOR LIGBT//INSULATED GATE BIPOLAR TRANSISTORS IGBTS |
9 | 0.0000045500 | MULTIPROCESSOR COMPUTER ARCHITECTURES//SLEEPING BAG//UPWINDING SCHEME |
10 | 0.0000045429 | SPECIFIC ON RESISTANCE//BREAKDOWN VOLTAGE BV//LDMOS |