Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
18868 | 466 | 17.2 | 47% |
Classes in level above (level 2) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
512 | 14399 | PLASMA SOURCES SCIENCE & TECHNOLOGY//PLASMA DISPLAY PANEL PDP//PLASMA DISPLAY PANEL |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | PLASMA ANTENNA | Author keyword | 7 | 40% | 3% | 14 |
2 | PLASMA STEALTH | Author keyword | 6 | 58% | 2% | 7 |
3 | STATE PULSE POWER LASER TECHNOL | Address | 5 | 63% | 1% | 5 |
4 | ELECTROMAGNETIC WAVE PROPAGATION IN PLASMA | Author keyword | 4 | 67% | 1% | 4 |
5 | PLASMA ANTENNAS | Author keyword | 4 | 46% | 1% | 6 |
6 | INFRARED LOW TEMP PLASMA ANHUI PROV | Address | 4 | 36% | 2% | 8 |
7 | INHOMOGENEOUS TIME VARYING PLASMA | Author keyword | 3 | 100% | 1% | 3 |
8 | PLASMA BASIC PROPERTIES | Author keyword | 3 | 100% | 1% | 3 |
9 | COMMUNICATION BLACKOUT | Author keyword | 2 | 67% | 0% | 2 |
10 | PLASMA CLOAKING | Author keyword | 2 | 67% | 0% | 2 |
Web of Science journal categories |
Author Key Words |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | PLASMA SLAB | 6 | 80% | 1% | 4 |
2 | ATMOSPHERIC PRESSURE PLASMAS | 6 | 26% | 4% | 19 |
3 | ANISOTROPIC SPHERE | 4 | 67% | 1% | 4 |
4 | NONUNIFORM PLASMA SLAB | 4 | 67% | 1% | 4 |
5 | GENERATED PLASMAS | 3 | 57% | 1% | 4 |
6 | ANISOTROPIC MAGNETIZED PLASMAS | 3 | 60% | 1% | 3 |
7 | COUPLED NITROGEN PLASMA | 2 | 44% | 1% | 4 |
8 | ELECTROMAGNETIC REFLECTION | 1 | 33% | 1% | 3 |
9 | PROCESSING SYSTEM | 1 | 13% | 2% | 8 |
10 | PRESSURE PLASMAS | 1 | 19% | 1% | 4 |
Journals |
Reviews |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | STATE PULSE POWER LASER TECHNOL | 5 | 63% | 1.1% | 5 |
2 | INFRARED LOW TEMP PLASMA ANHUI PROV | 4 | 36% | 1.7% | 8 |
3 | CHONGQING COMMUN | 1 | 50% | 0.2% | 1 |
4 | DIP INGN BIOMED ELETTRON TELECOMUNICAZ | 1 | 50% | 0.2% | 1 |
5 | GRP ELECT SISTEMAS TELECOMUNICAC | 1 | 50% | 0.2% | 1 |
6 | IRIEE | 1 | 50% | 0.2% | 1 |
7 | TELECOMMUN ENGN IT GRP | 1 | 50% | 0.2% | 1 |
8 | WILLS PLASMA PHYS | 1 | 50% | 0.2% | 1 |
9 | INFRARED LOW TEMP PLASMA ANHUI PROVINCE | 0 | 33% | 0.2% | 1 |
10 | PLASMA ELECT NEW METHODS ACCELERAT | 0 | 33% | 0.2% | 1 |
Related classes at same level (level 1) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000245060 | VACUUM TECHNOL//ACTIVE PLASMA RESONANCE SPECTROSCOPY//CUTOFF PROBE |
2 | 0.0000181736 | ELE OMAGNET COMPLEX MEDIA//RELATIVISTIC IONIZATION FRONT//TIME VARYING MEDIUM |
3 | 0.0000099347 | ANTENNA MICROWAVES//ISOREFRACTIVE MEDIA//MATHIEU CHARACTERISTIC NUMBERS |
4 | 0.0000092997 | NUMERICAL DISPERSION//ALTERNATING DIRECTION IMPLICIT FINITE DIFFERENCE TIME DOMAIN ADI FDTD//ALTERNATING DIRECTION IMPLICIT FINITE DIFFERENCE TIME DOMAIN ADI FDTD METHOD |
5 | 0.0000091735 | GAS JET DEPOSITION//ELECTRON BEAM PLASMA//JET VAPOR DEPOSITION |
6 | 0.0000087019 | NS KURNAKOV//ELE OPHYS IL//PLASMA SLAB |
7 | 0.0000072981 | SURFACE WAVE PLASMA//GRP ESPE OSCOPIA PLASMAS//GRP PHYS PLASMAS |
8 | 0.0000062433 | SEMICONDUCTOR OBSTACLE//DOUBLE RIDGED H TYPE WAVEGUIDE//CUTOFF FILTER |
9 | 0.0000056526 | MULTIPACTOR//AURORA SOFTWARE TESTING SL//ELECTRON CLOUD INSTABILITY |
10 | 0.0000050331 | LOW INDUCTANCE ANTENNA//LOW DAMAGE PROCESS//INDUCTIVELY COUPLED PLASMA |