Class information for:
Level 1: CLUSTER OF DEFECTS//GROUP II ELEMENTS//SI CD

Basic class information

ID Publications Average number
of references
Avg. shr. active
ref. in WoS
18368 490 21.1 46%



Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 2)



ID, lev.
above
Publications Label for level above
372 16511 SWAMP//OXYGEN PRECIPITATION//GROWN IN DEFECT

Terms with highest relevance score



Rank Term Type of term Relevance score
(tfidf)
Class's shr.
of term's tot.
occurrences
Shr. of publ.
in class containing
term
Num. of
publ.
in class
1 CLUSTER OF DEFECTS Author keyword 1 50% 0% 1
2 GROUP II ELEMENTS Author keyword 1 50% 0% 1
3 SI CD Author keyword 1 50% 0% 1
4 UNIAXIAL STRESS SPECTROSCOPY Author keyword 1 50% 0% 1
5 W CENTER Author keyword 1 50% 0% 1
6 WIRELESS COMM S Address 1 50% 0% 1
7 ANNEALING PROCEDURES Author keyword 0 33% 0% 1
8 CARBON COMPLEXES Author keyword 0 33% 0% 1
9 EFG SILICON Author keyword 0 33% 0% 1
10 LOFFE PHYSICOTECH Address 0 33% 0% 1

Web of Science journal categories

Author Key Words



Rank Web of Science journal category Relevance score
(tfidf)
Class's shr.
of term's tot.
occurrences
Shr. of publ.
in class containing
term
Num. of
publ.
in class
LCSH search Wikipedia search
1 CLUSTER OF DEFECTS 1 50% 0% 1 Search CLUSTER+OF+DEFECTS Search CLUSTER+OF+DEFECTS
2 GROUP II ELEMENTS 1 50% 0% 1 Search GROUP+II+ELEMENTS Search GROUP+II+ELEMENTS
3 SI CD 1 50% 0% 1 Search SI++CD Search SI++CD
4 UNIAXIAL STRESS SPECTROSCOPY 1 50% 0% 1 Search UNIAXIAL+STRESS+SPECTROSCOPY Search UNIAXIAL+STRESS+SPECTROSCOPY
5 W CENTER 1 50% 0% 1 Search W+CENTER Search W+CENTER
6 ANNEALING PROCEDURES 0 33% 0% 1 Search ANNEALING+PROCEDURES Search ANNEALING+PROCEDURES
7 CARBON COMPLEXES 0 33% 0% 1 Search CARBON+COMPLEXES Search CARBON+COMPLEXES
8 EFG SILICON 0 33% 0% 1 Search EFG+SILICON Search EFG+SILICON
9 SILICON NANOTIPS 0 33% 0% 1 Search SILICON+NANOTIPS Search SILICON+NANOTIPS
10 SPECTROSCOPIC DATA ANALYSIS 0 33% 0% 1 Search SPECTROSCOPIC+DATA+ANALYSIS Search SPECTROSCOPIC+DATA+ANALYSIS

Key Words Plus



Rank Web of Science journal category Relevance score
(tfidf)
Class's shr.
of term's tot.
occurrences
Shr. of publ.
in class containing
term
Num. of
publ. in
class
1 DOPED CRYSTALLINE SILICON 7 53% 2% 9
2 C LINE DEFECT 6 100% 1% 4
3 INTERSTITIAL CARBON 4 24% 3% 15
4 ISOELECTRONIC BOUND EXCITONS 4 56% 1% 5
5 OXYGEN RICH SILICON 3 57% 1% 4
6 LUMINESCENCE DECAY TIME 3 50% 1% 4
7 BERYLLIUM DOPED SILICON 2 67% 0% 2
8 RADIATION DAMAGE CENTERS 2 50% 1% 3
9 COMPLEX DEFECTS 1 31% 1% 4
10 BUILDUP KINETICS 1 100% 0% 2

Journals

Reviews



Title Publ. year Cit. Active references % act. ref.
to same field
THE OPTICAL-PROPERTIES OF LUMINESCENCE-CENTERS IN SILICON 1989 328 96 55%
Photoluminescence of deep defects involving transition metals in Si: New insights from highly enriched Si-28 2011 11 116 41%
Exciton Spectroscopy of Group(III) and Group(V) impurities, of hydrogen-containing defects, and of V-6 vacancy clusters in silicon 2005 1 12 92%
Silicon as an emissive optical medium 2007 23 69 22%
ELECTRONIC-STRUCTURE AND BOUND EXCITONS FOR DEFECTS IN SEMICONDUCTORS FROM OPTICAL SPECTROSCOPY 1988 15 44 52%
Light emission from silicon 1997 36 91 21%
Optical measurements of point defects 1999 3 51 43%

Address terms



Rank Address term Relevance score
(tfidf)
Class's shr.
of term's tot.
occurrences
Shr. of publ.
in class containing
term
Num. of
publ.
in class
1 WIRELESS COMM S 1 50% 0.2% 1
2 LOFFE PHYSICOTECH 0 33% 0.2% 1
3 TECHNOL DEV OFF 0 18% 0.4% 2
4 ICHHPS 0 17% 0.4% 2
5 SCI JEROME 0 17% 0.2% 1
6 POWER DEVICE 0 14% 0.2% 1
7 HIGH VOLTAGE EQUIPMENT 0 13% 0.2% 1
8 ULSI DEV DEV S 0 100% 0.2% 1

Related classes at same level (level 1)



Rank Relatedness score Related classes
1 0.0000218208 LIFETIME CONTROL//SEMI INSULATING MATERIALS//POWER DIODES
2 0.0000162449 GETTERING//GETTERING EFFICIENCY//SI AU
3 0.0000146617 BANDLIKE STATES//DISLOCATION ENGINEERED//RECOMBINATION STRENGTH
4 0.0000114413 ODCR//OPTICALLY DETECTED CYCLOTRON RESONANCE ODCR//CNRS PHYS SOLIDES 154
5 0.0000107301 HYDROGEN IN SILICON//MULTIVACANCY//HYDROGEN IN SI
6 0.0000106305 OXYGEN PRECIPITATION//GROWN IN DEFECT//CZOCHRALSKI SILICON
7 0.0000099912 GAP N//PICOSECOND TIMING RESOLUTION//SI H BOND DISSOCIATION
8 0.0000089178 OPTIMIZATION OF ANNEALING//ERBIUM RELATED CENTRES//SELF ASSEMBLED SILICON QUANTUM WELLS
9 0.0000088111 ELECT MAT DEVICES NANOSTRUCT//L DLTS//CNR IMM MATIS
10 0.0000086114 STRAINED SI1 XGEX SI QUANTUM WELLS//SI SIGE SUPERLATTICE//STRAINED SIGE SI