Class information for:
Level 1: FILM EDGE//SHAPE ENGINEERING//SILICON TECHNOLOGIES

Basic class information
ID Publications Average number
of references		 Avg. shr. active
ref. in WoS
17884 514 17.1 37%


Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 2)


ID, lev.
above		 Publications Label for level above
138 22619 IEEE TRANSACTIONS ON ELECTRON DEVICES//IEEE ELECTRON DEVICE LETTERS//SOLID-STATE ELECTRONICS

Terms with highest relevance score


Rank Term Type of term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class
1 FILM EDGE Author keyword 2 67% 0% 2
2 SHAPE ENGINEERING Author keyword 1 50% 0% 2
3 SILICON TECHNOLOGIES Author keyword 1 50% 0% 2
4 THERMAL OXIDATION OF SILICON Author keyword 1 40% 0% 2
5 BIRDS BEAK Author keyword 1 25% 1% 3
6 ATOMIC SCALE ANALYSIS Author keyword 1 50% 0% 1
7 CHEMICAL AFFINITY TENSOR Author keyword 1 50% 0% 1
8 COMPRESSIBLE AND INCOMPRESSIBLE FLUID MECHANICAL PROBLEMS Author keyword 1 50% 0% 1
9 IN SITU STEAM GENERATION Author keyword 1 50% 0% 1
10 LOW VOLTAGES Author keyword 1 50% 0% 1

Web of Science journal categories

Author Key Words


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class		 LCSH search Wikipedia search
1 FILM EDGE 2 67% 0% 2 Search FILM+EDGE Search FILM+EDGE
2 SHAPE ENGINEERING 1 50% 0% 2 Search SHAPE+ENGINEERING Search SHAPE+ENGINEERING
3 SILICON TECHNOLOGIES 1 50% 0% 2 Search SILICON+TECHNOLOGIES Search SILICON+TECHNOLOGIES
4 THERMAL OXIDATION OF SILICON 1 40% 0% 2 Search THERMAL+OXIDATION+OF+SILICON Search THERMAL+OXIDATION+OF+SILICON
5 BIRDS BEAK 1 25% 1% 3 Search BIRDS+BEAK Search BIRDS+BEAK
6 ATOMIC SCALE ANALYSIS 1 50% 0% 1 Search ATOMIC+SCALE+ANALYSIS Search ATOMIC+SCALE+ANALYSIS
7 CHEMICAL AFFINITY TENSOR 1 50% 0% 1 Search CHEMICAL+AFFINITY+TENSOR Search CHEMICAL+AFFINITY+TENSOR
8 COMPRESSIBLE AND INCOMPRESSIBLE FLUID MECHANICAL PROBLEMS 1 50% 0% 1 Search COMPRESSIBLE+AND+INCOMPRESSIBLE+FLUID+MECHANICAL+PROBLEMS Search COMPRESSIBLE+AND+INCOMPRESSIBLE+FLUID+MECHANICAL+PROBLEMS
9 IN SITU STEAM GENERATION 1 50% 0% 1 Search IN+SITU+STEAM+GENERATION Search IN+SITU+STEAM+GENERATION
10 LOW VOLTAGES 1 50% 0% 1 Search LOW+VOLTAGES Search LOW+VOLTAGES

Key Words Plus


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 LOCOS 29 88% 3% 14
2 LOCAL OXIDATION 6 18% 6% 30
3 SI3N4 FILM EDGES 6 100% 1% 4
4 FILM EDGES 4 67% 1% 4
5 NONPLANAR OXIDATION 4 75% 1% 3
6 DIMENSIONAL THERMAL OXIDATION 3 31% 2% 8
7 INDUCED DISLOCATION GENERATION 3 32% 1% 7
8 CRYSTALLIZATION INDUCED STRESS 2 44% 1% 4
9 3 DIMENSIONAL PROCESS SIMULATOR 1 100% 0% 2
10 LOCOS ISOLATION 1 50% 0% 2

Journals

Reviews


Title Publ. year Cit. Active
references		 % act. ref.
to same field
STRESS-RELATED PROBLEMS IN SILICON TECHNOLOGY 1991 292 91 36%
ISOLATION TECHNOLOGY IN MONOLITHIC INTEGRATED-CIRCUITS - AN OVERVIEW 1994 0 21 38%
CONSERVATION-LAWS FOR MASS, MOMENTUM, AND ENERGY - APPLICATION TO SEMICONDUCTOR-DEVICES AND TECHNOLOGY 1985 0 2 50%
PERFECTING THE SOLID-STATE 1992 2 7 14%
ADVANCED DEVICE ISOLATION FOR VERY LARGE-SCALE INTEGRATION 1985 0 5 40%

Address terms


Rank Address term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class
1 MAT SEMICOND DEVICES 1 50% 0.2% 1
2 SHERMAN FAIRCHILD SOLID STATE STUDY 1 50% 0.2% 1
3 KITA ITAMI ADM 0 33% 0.2% 1
4 NON VOLATILE MEMORY PROC DEV 0 33% 0.2% 1
5 SEMICOND MAT ENGN 0 25% 0.2% 1
6 ELECT ENGN ESAT INSYS 0 20% 0.2% 1
7 IISMEGURO KU 0 20% 0.2% 1
8 MICROELECT ENGN S 0 14% 0.2% 1
9 SUPER ELECT NORD 0 14% 0.2% 1
10 186031Z 0 100% 0.2% 1

Related classes at same level (level 1)


Rank Relatedness score Related classes
1 0.0000232384 SIDEWALL OXIDATION//COMPUTAT ELECT//MEMORY DEVICE BUSINESS
2 0.0000168745 INTERFACIAL SILICON EMISSION//SILICON OXIDATION//LOW TEMPERATURE SILICON OXIDATION
3 0.0000134893 POLYOXIDE//INTERPOLY OXIDE//NONPLANAR POLYOXIDE
4 0.0000127293 CERAM PHYS//RIN//CONCENTRATED STRESS
5 0.0000093361 ION BEAM THINNING//MAT SCI PROD TECHNOL//TECHNOL PLANNING CENT ELECT S
6 0.0000089197 ELLIPSOIDAL TECHNIQUE//DESIGN CENTERING//PARAMETRIC YIELD
7 0.0000081458 MULTIPLE SCALING ASYMPTOTIC EXPANSIONS//DRIFT DIFFUSION PROCESSES//MOTION OF CHARGED PARTICLES
8 0.0000080519 SECT PROD PROC QUAL//MATURITY INDEX ON RELIABILITY MIR//FAST FIELD FEEDBACK
9 0.0000071382 TRANSIENT ENHANCED DIFFUSION//SWAMP//PAIR DIFFUSION MODEL
10 0.0000068930 RECH PERFORMANCE ENTREPRISES//SLIDER FABRICATION//CMOS BASED MICROSYSTEM