Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
17430 | 536 | 24.0 | 61% |
Classes in level above (level 2) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
751 | 11810 | ATOMIC FORCE MICROSCOPE//DISSENY PROGRAMACIO SISTEMES ELECT//LOCAL ANODIC OXIDATION |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | SINGLE ATOM TIP | Author keyword | 15 | 88% | 1% | 7 |
2 | SUR E MODIFICAT | Address | 7 | 15% | 8% | 43 |
3 | SINGLE ATOM TIPS | Author keyword | 6 | 80% | 1% | 4 |
4 | FACETING | Author keyword | 6 | 14% | 8% | 42 |
5 | EMISS ELECT | Address | 4 | 42% | 1% | 8 |
6 | GAS FIELD ION SOURCE | Author keyword | 3 | 57% | 1% | 4 |
7 | FIELD EMISSION SPECTROSCOPY | Author keyword | 3 | 43% | 1% | 6 |
8 | FRESNEL PROJECTION MICROSCOPE | Author keyword | 3 | 100% | 1% | 3 |
9 | ULTRASHARP FIELD EMITTERS | Author keyword | 3 | 100% | 1% | 3 |
10 | POINT PROJECTION MICROSCOPY | Author keyword | 3 | 60% | 1% | 3 |
Web of Science journal categories |
Author Key Words |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | ACTIVATED NITROGEN | 42 | 94% | 3% | 15 |
2 | W111 | 37 | 53% | 9% | 49 |
3 | PROJECTION MICROSCOPY | 29 | 77% | 4% | 20 |
4 | FRESNEL PROJECTION MICROSCOPY | 24 | 91% | 2% | 10 |
5 | ULTRATHIN METAL FILMS | 22 | 37% | 9% | 48 |
6 | W111 SURFACES | 20 | 100% | 2% | 9 |
7 | IR SURFACES | 15 | 67% | 3% | 14 |
8 | MO111 | 15 | 82% | 2% | 9 |
9 | SINGLE ATOM TIPS | 15 | 77% | 2% | 10 |
10 | AXIALLY SYMMETRICAL FORCES | 12 | 63% | 2% | 12 |
Journals |
Reviews |
Title | Publ. year | Cit. | Active references | % act. ref. to same field |
---|---|---|---|---|
Progress in electron- and ion-interferometry | 2010 | 34 | 155 | 34% |
Low energy electron point source microscopy: beyond imaging | 2010 | 12 | 57 | 70% |
Point-projection electron imaging of tobacco mosaic virus at 40 eV electron energy | 1999 | 23 | 9 | 67% |
Nanoscale surface chemistry over faceted substrates: structure, reactivity and nanotemplates | 2008 | 23 | 89 | 39% |
Quest for high brightness, monochromatic noble gas ion sources | 2005 | 52 | 68 | 25% |
Optimization of the low energy electron point source microscope: imaging of macromolecules | 2002 | 7 | 41 | 61% |
Tomographic reconstruction of multiple in-line electron holograms of realistic objects | 2005 | 2 | 28 | 75% |
Improved low energy electron projection in-line holograms reconstruction: application to the holograms of a tungsten tip | 2002 | 1 | 19 | 74% |
Surface facetting induced by adsorbates | 2003 | 82 | 69 | 6% |
STEM and shadow-imaging of biomolecules at 6 eV beam energy | 1997 | 13 | 32 | 31% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | SUR E MODIFICAT | 7 | 15% | 8.0% | 43 |
2 | EMISS ELECT | 4 | 42% | 1.5% | 8 |
3 | ULTIMATE TECHNOL NANOELECT CUTE | 1 | 100% | 0.4% | 2 |
4 | ELEKTROCHEM | 1 | 11% | 1.7% | 9 |
5 | ELECT ENGN SEONGBUK KU | 1 | 50% | 0.2% | 1 |
6 | HELMHOLTZ ULM HIU ELE OCHEM ENERGY STORAGE | 1 | 50% | 0.2% | 1 |
7 | TONOMURA ELE ON WAVEFRONT PROJECT | 1 | 50% | 0.2% | 1 |
8 | DPM EMISS ELECT | 0 | 33% | 0.2% | 1 |
9 | ELECT NANOTECHNOL C TEURS | 0 | 18% | 0.4% | 2 |
10 | SHINUKU KU | 0 | 25% | 0.2% | 1 |
Related classes at same level (level 1) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000270640 | APEX RADIUS//GRP MAT NANOESTRUCT//TIP FABRICATION |
2 | 0.0000183238 | MICROCOLUMN//SCHOTTKY EMITTER//PROD DESIGN TECHNOL |
3 | 0.0000148067 | ELECTRON HOLOGRAPHY//OFF AXIS ELECTRON HOLOGRAPHY//TRIEBENBERG |
4 | 0.0000123323 | AUGER TRANSISTOR//SELF CONSISTENT QUANTUM WELLS//CE2CUGE6 |
5 | 0.0000088877 | METAL METAL INTERFACES//BIMETALLIC SURFACES//SURFACE ALLOYS |
6 | 0.0000070218 | FIELD EMISSION//VACUUM MICROELECTRONICS//FIELD EMITTER ARRAY |
7 | 0.0000069465 | LOCAL TUNNELING BARRIER HEIGHT//LOCAL TUNNELING BARRIER HEIGHT LBH//I S CHARACTERISTICS |
8 | 0.0000066632 | LIQUID METAL ION SOURCE//LIQUID METAL ION SOURCES//ION BEAMS MAT |
9 | 0.0000060702 | TPR CO//ADSORPT CATALYSIS ENVIRONM PROTECT//MOLEC CHEM ENGN |
10 | 0.0000057961 | ELECTRON BEAM INDUCED DEPOSITION//FOCUSED ELECTRON BEAM INDUCED DEPOSITION//FOCUSED ION BEAM CHEMICAL VAPOR DEPOSITION FIB CVD |