Class information for:
Level 1: LATERAL CRYSTALLINE GROWTH//ACCELERATORS//ION INDUCED DEFECTS

Basic class information

ID Publications Average number
of references
Avg. shr. active
ref. in WoS
16662 577 19.4 55%



Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 2)



ID, lev.
above
Publications Label for level above
769 11658 SIGE//GERMANIUM//STRAINED SI

Terms with highest relevance score



Rank Term Type of term Relevance score
(tfidf)
Class's shr.
of term's tot.
occurrences
Shr. of publ.
in class containing
term
Num. of
publ.
in class
1 LATERAL CRYSTALLINE GROWTH Author keyword 2 67% 0% 2
2 ACCELERATORS Address 1 27% 1% 3
3 ION INDUCED DEFECTS Author keyword 1 33% 0% 2
4 ALPHA FE FILM Author keyword 1 50% 0% 1
5 BOMBARDMENT EFFECT Author keyword 1 50% 0% 1
6 EPITAXIAL TEMPERATURE Author keyword 1 50% 0% 1
7 HIGH TECHNOL NEW BUSINESS SYST DEV GRP Address 1 50% 0% 1
8 LIMITING THICKNESS Author keyword 1 50% 0% 1
9 N MOS Author keyword 1 50% 0% 1
10 SI EFFUSION CELL Author keyword 1 50% 0% 1

Web of Science journal categories

Author Key Words



Rank Web of Science journal category Relevance score
(tfidf)
Class's shr.
of term's tot.
occurrences
Shr. of publ.
in class containing
term
Num. of
publ.
in class
LCSH search Wikipedia search
1 LATERAL CRYSTALLINE GROWTH 2 67% 0% 2 Search LATERAL+CRYSTALLINE+GROWTH Search LATERAL+CRYSTALLINE+GROWTH
2 ION INDUCED DEFECTS 1 33% 0% 2 Search ION+INDUCED+DEFECTS Search ION+INDUCED+DEFECTS
3 ALPHA FE FILM 1 50% 0% 1 Search ALPHA+FE+FILM Search ALPHA+FE+FILM
4 BOMBARDMENT EFFECT 1 50% 0% 1 Search BOMBARDMENT+EFFECT Search BOMBARDMENT+EFFECT
5 EPITAXIAL TEMPERATURE 1 50% 0% 1 Search EPITAXIAL+TEMPERATURE Search EPITAXIAL+TEMPERATURE
6 LIMITING THICKNESS 1 50% 0% 1 Search LIMITING+THICKNESS Search LIMITING+THICKNESS
7 N MOS 1 50% 0% 1 Search N+MOS Search N+MOS
8 SI EFFUSION CELL 1 50% 0% 1 Search SI+EFFUSION+CELL Search SI+EFFUSION+CELL
9 SPUTTERING SIMULATION 1 50% 0% 1 Search SPUTTERING+SIMULATION Search SPUTTERING+SIMULATION
10 SYNCHROTRON RADIATION APPLICATION 1 50% 0% 1 Search SYNCHROTRON+RADIATION+APPLICATION Search SYNCHROTRON+RADIATION+APPLICATION

Key Words Plus



Rank Web of Science journal category Relevance score
(tfidf)
Class's shr.
of term's tot.
occurrences
Shr. of publ.
in class containing
term
Num. of
publ. in
class
1 SI100 FILMS 19 74% 2% 14
2 IN IONS 10 63% 2% 10
3 QUASIDYNAMICS SIMULATIONS 7 53% 2% 10
4 PHASE CRYSTAL GROWTH 5 43% 2% 9
5 STRAIN MODIFICATION 4 75% 1% 3
6 ENERGY PARTICLE BOMBARDMENT 4 36% 1% 8
7 ATOMS INCIDENT 3 57% 1% 4
8 4W1C 3 100% 1% 3
9 LIMITED THICKNESS EPITAXY 3 100% 1% 3
10 EV SI 3 60% 1% 3

Journals

Reviews



Title Publ. year Cit. Active references % act. ref.
to same field
DELTA DOPING IN SILICON 1993 58 180 38%
RECENT PROGRESS IN SILICON MOLECULAR-BEAM EPITAXY 1991 0 13 85%
SILICON MOLECULAR-BEAM EPITAXY 1983 65 21 48%
PRESENT STATUS OF SOLID-PHASE EPITAXY OF VACUUM-DEPOSITED SILICON 1989 18 52 31%
SILICON MOLECULAR-BEAM EPITAXY 1986 3 19 37%

Address terms



Rank Address term Relevance score
(tfidf)
Class's shr.
of term's tot.
occurrences
Shr. of publ.
in class containing
term
Num. of
publ.
in class
1 ACCELERATORS 1 27% 0.5% 3
2 HIGH TECHNOL NEW BUSINESS SYST DEV GRP 1 50% 0.2% 1
3 SISC 0 33% 0.2% 1
4 HH MANNHEIM 0 25% 0.2% 1
5 MAT SCI SUR E ENGN 0 25% 0.2% 1
6 ABT SI PHOTOVOLTAIK 0 13% 0.2% 1
7 AIST ONRI 0 100% 0.2% 1
8 FREDEROCL SEITZ MAT 0 100% 0.2% 1
9 INEP IVTAN ASSOC 0 100% 0.2% 1
10 LOBACHEVSKI PHYSICOTECH 0 100% 0.2% 1

Related classes at same level (level 1)



Rank Relatedness score Related classes
1 0.0000183530 NOVOSHAKHTINSK BRANCH//ELE OCHEM HYDROGEN ENERGY//IRON STEEL IND
2 0.0000171485 ATOMIC LAYER DOPING//SI EPITAXIAL GROWTH//GERMANIUM SILICON COMPOUNDS
3 0.0000166549 SURFACTANT MEDIATED EPITAXY//BI NANOLINES//SI100 2X1 SB
4 0.0000123452 STRAINED SI1 XGEX SI QUANTUM WELLS//SI SIGE SUPERLATTICE//STRAINED SIGE SI
5 0.0000117632 DELTA DOPING//SELF CONSISTENTLY//DELTA DOPED QUANTUM WELLS
6 0.0000114151 HYDROGEN SURFACTANT//AUSTRALIAN COUNCIL EXCELLENCE QUANTUM COM//EXCELLENCE QUANTUM COMPUTAT COMMUN TECHNOL
7 0.0000105375 LANGMUIR SORPTION MODEL//ION CLUSTER BEAM DEPOSITION//IONIZED CLUSTER BEAM TECHNIQUE
8 0.0000077144 NEGATIVE ION IMPLANTATION//DELTA LAYERED NANOPARTICLES//AB INITIO MOLECULAR ORBITAL METHODS
9 0.0000075570 DAS STRUCTURE//SN GE111//SI111 7 X 7
10 0.0000071964 IBIEC//SOLID PHASE EPITAXIAL GROWTH//LATERAL SOLID PHASE EPITAXY