Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
15951 | 614 | 20.5 | 51% |
Classes in level above (level 2) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
1474 | 7153 | COPPER VAPOR LASER//MET V OUR LASERS//FAK PHYS E12 |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | EXCILAMP | Author keyword | 16 | 51% | 4% | 23 |
2 | KRCL EXCILAMP | Author keyword | 6 | 80% | 1% | 4 |
3 | EXCILAMPS | Author keyword | 5 | 54% | 1% | 7 |
4 | ARGON EXCIMER LAMP | Author keyword | 4 | 75% | 0% | 3 |
5 | VACUUM ULTRAVIOLET PHOTOLYSIS | Author keyword | 4 | 75% | 0% | 3 |
6 | XEBR EXCILAMP | Author keyword | 4 | 75% | 0% | 3 |
7 | HBEREICH UMWELT VERFAHRENSTECH | Address | 3 | 100% | 0% | 3 |
8 | KRCL PHOTOREACTOR | Author keyword | 3 | 100% | 0% | 3 |
9 | LEHRSTUHL UMWELTMESSTECH | Address | 3 | 17% | 2% | 15 |
10 | EXCIMER LAMPS | Author keyword | 2 | 29% | 1% | 7 |
Web of Science journal categories |
Author Key Words |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | EXCILAMP | 16 | 51% | 4% | 23 | Search EXCILAMP | Search EXCILAMP |
2 | KRCL EXCILAMP | 6 | 80% | 1% | 4 | Search KRCL+EXCILAMP | Search KRCL+EXCILAMP |
3 | EXCILAMPS | 5 | 54% | 1% | 7 | Search EXCILAMPS | Search EXCILAMPS |
4 | ARGON EXCIMER LAMP | 4 | 75% | 0% | 3 | Search ARGON+EXCIMER+LAMP | Search ARGON+EXCIMER+LAMP |
5 | VACUUM ULTRAVIOLET PHOTOLYSIS | 4 | 75% | 0% | 3 | Search VACUUM+ULTRAVIOLET+PHOTOLYSIS | Search VACUUM+ULTRAVIOLET+PHOTOLYSIS |
6 | XEBR EXCILAMP | 4 | 75% | 0% | 3 | Search XEBR+EXCILAMP | Search XEBR+EXCILAMP |
7 | KRCL PHOTOREACTOR | 3 | 100% | 0% | 3 | Search KRCL+PHOTOREACTOR | Search KRCL+PHOTOREACTOR |
8 | EXCIMER LAMPS | 2 | 29% | 1% | 7 | Search EXCIMER+LAMPS | Search EXCIMER+LAMPS |
9 | 185 NM | 2 | 67% | 0% | 2 | Search 185+NM | Search 185+NM |
10 | XENON EXCIMER LAMP | 2 | 67% | 0% | 2 | Search XENON+EXCIMER+LAMP | Search XENON+EXCIMER+LAMP |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | EXCILAMPS | 68 | 84% | 6% | 37 |
2 | BARRIER DISCHARGE EXCILAMPS | 17 | 72% | 2% | 13 |
3 | QUASI CONTINUOUS OPERATION | 16 | 61% | 3% | 17 |
4 | KRCL | 15 | 77% | 2% | 10 |
5 | VUV PHOTOLYSIS | 15 | 77% | 2% | 10 |
6 | 172 NM | 9 | 48% | 2% | 13 |
7 | EXCIMER LAMPS | 7 | 40% | 2% | 14 |
8 | VACUUM UV OXIDATION | 6 | 80% | 1% | 4 |
9 | ULTRAVIOLET VUV PHOTOLYSIS | 6 | 71% | 1% | 5 |
10 | XENON EXCIMER LAMP | 6 | 50% | 1% | 9 |
Journals |
Reviews |
Title | Publ. year | Cit. | Active references |
% act. ref. to same field |
---|---|---|---|---|
Vacuum-UV radiation at 185 nm in water treatment - A review | 2014 | 10 | 62 | 34% |
Excilamps: efficient sources of spontaneous UV and VUV radiation | 2003 | 89 | 39 | 72% |
Applications of capacitive and barrier discharge excilamps in photoscience | 2006 | 78 | 93 | 48% |
Recent progress on application of UV excilamps for degradation of organic pollutants and microbial inactivation | 2012 | 16 | 62 | 52% |
Vacuum-ultraviolet photolysis of aqueous reaction systems | 2004 | 86 | 57 | 25% |
Excilamps and their applications | 2012 | 5 | 42 | 62% |
Capacitive and barrier discharge excilamps and their applications | 2006 | 22 | 21 | 52% |
Studying the thermodynamic processes in excilamps by the pressure jump method (Review) | 2012 | 0 | 9 | 100% |
UV curing and matting of acrylate coatings reinforced by nano-silica and micro-corundum particles | 2007 | 37 | 19 | 16% |
KrCl barrier-discharge excilamps: Energy characteristics and applications (Review) | 2015 | 0 | 18 | 83% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | HBEREICH UMWELT VERFAHRENSTECH | 3 | 100% | 0.5% | 3 |
2 | LEHRSTUHL UMWELTMESSTECH | 3 | 17% | 2.4% | 15 |
3 | POLLUT UNIT | 2 | 28% | 1.1% | 7 |
4 | PHOTOPHYS PHOTOCHEM MOL | 2 | 67% | 0.3% | 2 |
5 | PLASMA PHYS CONDUCTING MAT THEIR PLICAT | 2 | 67% | 0.3% | 2 |
6 | POLYTECH TOULOUSE PLASMA CONVERS | 2 | 67% | 0.3% | 2 |
7 | HH FURTWANGEN | 2 | 50% | 0.5% | 3 |
8 | ABT VILLINGEN WENNINGEN | 1 | 100% | 0.3% | 2 |
9 | BEREICH GAS PARTIKEL SYST | 1 | 50% | 0.3% | 2 |
10 | CNRSUNITE MIXTE RECH 5213 | 1 | 100% | 0.3% | 2 |
Related classes at same level (level 1) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000246319 | FAK PHYS E12//RARE GAS DIMER IONS//ARGON EXCIMER LASER |
2 | 0.0000196877 | DIELECTRIC BARRIER DISCHARGE//DIELECTRIC BARRIER DISCHARGE DBD//ATMOSPHERIC PRESSURE GLOW PLASMA |
3 | 0.0000112364 | PREIONISATION//UV NITROGEN LASER//LONGITUDINAL EXCITATION |
4 | 0.0000095371 | SILICON TETRAACETATE//F 2 LASER//N2O GAS |
5 | 0.0000094945 | MERCURY DIBROMIDE//DISSOCIATIVE EXCITATION//EXCITATION CROSS SECTION |
6 | 0.0000091626 | HIGH CURRENT ELECT//GAS DIODE//RUNAWAY ELECTRONS |
7 | 0.0000091484 | PHOTOCHEM PROC//PHOTOCHEMICAL LASER//FRE 2165 |
8 | 0.0000089518 | THERMIONIC VACUUM ARC//M EFFECT//THERMIONIC VACUUM ARC TVA |
9 | 0.0000065341 | PLASMA DISPLAY PANEL PDP//PLASMA DISPLAY PANEL//PDP |
10 | 0.0000064690 | NUCLEAR PUMPED LASERS//NUCLEAR PUMPING//DISTRIBUTED LOSS COEFFICIENT |