Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
14953 | 671 | 23.6 | 54% |
Classes in level above (level 2) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
138 | 22619 | IEEE TRANSACTIONS ON ELECTRON DEVICES//IEEE ELECTRON DEVICE LETTERS//SOLID-STATE ELECTRONICS |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | NEGATIVE BIAS TEMPERATURE INSTABILITY NBTI | Author keyword | 118 | 57% | 21% | 139 |
2 | NEGATIVE BIAS TEMPERATURE INSTABILITY | Author keyword | 24 | 48% | 6% | 38 |
3 | CHRISTIAN DOPPLER TCAD | Address | 13 | 80% | 1% | 8 |
4 | BIAS TEMPERATURE INSTABILITY | Author keyword | 12 | 37% | 4% | 26 |
5 | NBTI | Author keyword | 11 | 15% | 10% | 68 |
6 | BIAS TEMPERATURE INSTABILITY BTI | Author keyword | 11 | 40% | 3% | 21 |
7 | POSITIVE BIAS TEMPERATURE INSTABILITY PBTI | Author keyword | 10 | 39% | 3% | 21 |
8 | REACTION DIFFUSION R D MODEL | Author keyword | 10 | 63% | 1% | 10 |
9 | PLASMA OXYNITRIDE | Author keyword | 6 | 100% | 1% | 4 |
10 | FIELD ACCELERATION | Author keyword | 4 | 67% | 1% | 4 |
Web of Science journal categories |
Author Key Words |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | BIAS TEMPERATURE INSTABILITY | 65 | 37% | 21% | 139 |
2 | NBTI | 45 | 36% | 15% | 99 |
3 | NBTI DEGRADATION | 42 | 49% | 9% | 63 |
4 | INTERFACE TRAP GENERATION | 11 | 33% | 4% | 27 |
5 | TEMPERATURE INSTABILITY | 10 | 57% | 2% | 12 |
6 | I DLIN TECHNIQUE | 9 | 59% | 1% | 10 |
7 | P MOSFETS | 9 | 20% | 6% | 38 |
8 | INTERFACE TRAP | 8 | 40% | 2% | 16 |
9 | SILICON DIOXIDES | 7 | 41% | 2% | 14 |
10 | SION GATE DIELECTRICS | 6 | 71% | 1% | 5 |
Journals |
Reviews |
Title | Publ. year | Cit. | Active references |
% act. ref. to same field |
---|---|---|---|---|
The negative bias temperature instability in MOS devices: A review | 2006 | 158 | 49 | 63% |
Review and reexamination of reliability effects related to NBTI-induced statistical variations | 2007 | 61 | 8 | 50% |
Negative bias temperature instability: Road to cross in deep submicron silicon semiconductor manufacturing | 2003 | 450 | 53 | 28% |
Unification of contemporary negative bias temperature instability models for p-MOSFET energy degradation | 2013 | 1 | 23 | 61% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | CHRISTIAN DOPPLER TCAD | 13 | 80% | 1.2% | 8 |
2 | RELIABIL GRP | 2 | 44% | 0.6% | 4 |
3 | CHRISTIAN DOPPLER TCAD MICROELECT | 2 | 36% | 0.6% | 4 |
4 | DEVICE RELIABIL ELECT CHARACTERIZAT GRP | 1 | 100% | 0.3% | 2 |
5 | TECHNOL RELIABIL DEV | 1 | 50% | 0.3% | 2 |
6 | CENT RELIABIL METHODOL | 1 | 33% | 0.3% | 2 |
7 | ANALYSIS TECHNOL DEV | 1 | 50% | 0.1% | 1 |
8 | CMOS DESIGN BACKPLANE GRP | 1 | 50% | 0.1% | 1 |
9 | CMOS RELIABIL GRP | 1 | 50% | 0.1% | 1 |
10 | CRD S | 1 | 50% | 0.1% | 1 |
Related classes at same level (level 1) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000223588 | SID4//DEUTERIUM D ANNEALING//TRAP CREATION |
2 | 0.0000190715 | DEVICE MODELLING GRP//RANDOM DOPANT//DEVICE MODELING GRP |
3 | 0.0000181850 | HOT CARRIER//CHANNEL INITIATED SECONDARY ELECTRON CHISEL//HOT CARRIER DEGRADATION |
4 | 0.0000148830 | OXIDE TRAPPED CHARGE//ELDRS//TOTAL IONIZING DOSE |
5 | 0.0000145524 | STRESS INDUCED LEAKAGE CURRENT//SOFT BREAKDOWN//DIELECTRIC BREAKDOWN BD |
6 | 0.0000140512 | SRAM//PROCESS VARIATION//POWER GATING |
7 | 0.0000098999 | BORON PENETRATION//REMOTE PLASMA NITRIDATION RPN//SI NITRIDE |
8 | 0.0000077564 | HFO2//HIGH K//METAL GATE |
9 | 0.0000059349 | SHORT CIRCUIT POWER DISSIPATION//TRANSISTOR SIZING//GATE SIZING |
10 | 0.0000051716 | SONOS//CHARGE TRAPPING LAYER//FLASH MEMORY |