Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
1483 | 2543 | 20.4 | 51% |
Classes in level above (level 2) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
372 | 16511 | SWAMP//OXYGEN PRECIPITATION//GROWN IN DEFECT |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | OXYGEN PRECIPITATION | Author keyword | 82 | 66% | 3% | 75 |
2 | GROWN IN DEFECT | Author keyword | 72 | 93% | 1% | 27 |
3 | CZOCHRALSKI SILICON | Author keyword | 61 | 56% | 3% | 75 |
4 | OSF RING | Author keyword | 33 | 100% | 1% | 13 |
5 | OXYGEN PRECIPITATE | Author keyword | 32 | 65% | 1% | 30 |
6 | GROWN IN DEFECTS | Author keyword | 27 | 70% | 1% | 23 |
7 | OXYGEN PRECIPITATES | Author keyword | 26 | 54% | 1% | 34 |
8 | THERMAL DONORS | Author keyword | 24 | 45% | 2% | 40 |
9 | CRYSTAL ORIGINATED PARTICLE | Author keyword | 23 | 100% | 0% | 10 |
10 | OXIDE PRECIPITATE | Author keyword | 19 | 76% | 1% | 13 |
Web of Science journal categories |
Author Key Words |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | OXYGEN PRECIPITATION | 82 | 66% | 3% | 75 | Search OXYGEN+PRECIPITATION | Search OXYGEN+PRECIPITATION |
2 | GROWN IN DEFECT | 72 | 93% | 1% | 27 | Search GROWN+IN+DEFECT | Search GROWN+IN+DEFECT |
3 | CZOCHRALSKI SILICON | 61 | 56% | 3% | 75 | Search CZOCHRALSKI+SILICON | Search CZOCHRALSKI+SILICON |
4 | OSF RING | 33 | 100% | 1% | 13 | Search OSF+RING | Search OSF+RING |
5 | OXYGEN PRECIPITATE | 32 | 65% | 1% | 30 | Search OXYGEN+PRECIPITATE | Search OXYGEN+PRECIPITATE |
6 | GROWN IN DEFECTS | 27 | 70% | 1% | 23 | Search GROWN+IN+DEFECTS | Search GROWN+IN+DEFECTS |
7 | OXYGEN PRECIPITATES | 26 | 54% | 1% | 34 | Search OXYGEN+PRECIPITATES | Search OXYGEN+PRECIPITATES |
8 | THERMAL DONORS | 24 | 45% | 2% | 40 | Search THERMAL+DONORS | Search THERMAL+DONORS |
9 | CRYSTAL ORIGINATED PARTICLE | 23 | 100% | 0% | 10 | Search CRYSTAL+ORIGINATED+PARTICLE | Search CRYSTAL+ORIGINATED+PARTICLE |
10 | OXIDE PRECIPITATE | 19 | 76% | 1% | 13 | Search OXIDE+PRECIPITATE | Search OXIDE+PRECIPITATE |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | CZOCHRALSKI SILICON | 269 | 57% | 13% | 318 |
2 | OXYGEN PRECIPITATION | 200 | 61% | 8% | 210 |
3 | SWIRL DEFECTS | 77 | 69% | 3% | 66 |
4 | MICRODEFECT FORMATION | 65 | 93% | 1% | 25 |
5 | CZOCHRALSKI GROWN SILICON | 63 | 49% | 4% | 93 |
6 | THERMALLY INDUCED MICRODEFECTS | 42 | 83% | 1% | 24 |
7 | AXIAL TEMPERATURE GRADIENT | 42 | 78% | 1% | 28 |
8 | IN DEFECTS | 41 | 81% | 1% | 25 |
9 | GROWN IN DEFECTS | 40 | 82% | 1% | 23 |
10 | THERMAL DONOR FORMATION | 38 | 50% | 2% | 56 |
Journals |
Reviews |
Title | Publ. year | Cit. | Active references | % act. ref. to same field |
---|---|---|---|---|
OXYGEN PRECIPITATION IN SILICON | 1995 | 348 | 194 | 82% |
Oxygen diffusion and precipitation in Czochralski silicon | 2000 | 100 | 84 | 74% |
Impurity engineering of Czochralski silicon | 2013 | 7 | 197 | 79% |
A selective review of the quantification of defect dynamics in growing Czochralski silicon crystals | 2005 | 16 | 53 | 81% |
Vacancy-oxygen defects in silicon: the impact of isovalent doping | 2014 | 2 | 151 | 40% |
Present status and prospect of Si wafers for ultra large scale integration | 2004 | 17 | 50 | 50% |
Defect engineering of Czochralski single-crystal silicon | 2000 | 64 | 93 | 47% |
IR studies of oxygen-vacancy related defects in irradiated silicon | 1999 | 14 | 42 | 71% |
Physical model of paths of microdefects nucleation in dislocation-free single crystals float-zone silicon | 2002 | 2 | 54 | 74% |
An electronics division retrospective 1952-2002 and future opportunities in the twenty-first century | 2002 | 8 | 119 | 40% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | SITIX | 13 | 71% | 0.4% | 10 |
2 | SEH ISOBE RD | 11 | 67% | 0.4% | 10 |
3 | RIAST | 7 | 38% | 0.6% | 15 |
4 | SIMULAT PART | 7 | 67% | 0.2% | 6 |
5 | QUANTITAT SILICON | 6 | 100% | 0.2% | 4 |
6 | SILICON MFG ENGN SUB | 6 | 100% | 0.2% | 4 |
7 | LTAM | 4 | 75% | 0.1% | 3 |
8 | SEMICOND MAT ENGN | 4 | 75% | 0.1% | 3 |
9 | INTEGRATED PROD BUSINESS UNIT | 4 | 56% | 0.2% | 5 |
10 | STATE SILICON MAT SCI | 3 | 22% | 0.6% | 14 |
Related classes at same level (level 1) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000123619 | GETTERING//GETTERING EFFICIENCY//SI AU |
2 | 0.0000106305 | CLUSTER OF DEFECTS//GROUP II ELEMENTS//SI CD |
3 | 0.0000097562 | ELECT MAT DEVICES NANOSTRUCT//L DLTS//CNR IMM MATIS |
4 | 0.0000090096 | FARADAY COLLECTOR//MAGNETIC ANALYZER//IMAGE WIDTH |
5 | 0.0000087285 | LIFETIME CONTROL//SEMI INSULATING MATERIALS//POWER DIODES |
6 | 0.0000084510 | MAGNETIC FIELD ASSISTED CZOCHRALSKI METHOD//CZOCHRALSKI METHOD//CZOCHRALSKI CRYSTAL GROWTH |
7 | 0.0000077257 | IRRADIATED P N JUNCTION LEAKAGE//JUNCTION SHAPE//P N JUNCTION LEAKAGE |
8 | 0.0000074161 | SIMOX//BURIED OXIDE LAYER//CONTACTLESS I V METHOD |
9 | 0.0000071660 | BANDLIKE STATES//DISLOCATION ENGINEERED//RECOMBINATION STRENGTH |
10 | 0.0000069025 | HYDROGEN IN SILICON//MULTIVACANCY//HYDROGEN IN SI |