Class information for:
Level 1: BOROPHOSPHOSILICATE GLASS BPSG//ATMOSPHERIC PRESSURE CVD//BPSG

Basic class information
ID Publications Average number
of references		 Avg. shr. active
ref. in WoS
14795 680 17.4 45%


Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 2)


ID, lev.
above		 Publications Label for level above
2557 3267 INTERFACIAL SILICON EMISSION//SILICON OXIDATION//GENIE URBAIN ENVIRONM

Terms with highest relevance score


Rank Term Type of term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class
1 BOROPHOSPHOSILICATE GLASS BPSG Author keyword 2 67% 0% 2
2 ATMOSPHERIC PRESSURE CVD Author keyword 2 27% 1% 6
3 BPSG Author keyword 2 22% 1% 7
4 FLOW SHAPED STEP COVERAGE Author keyword 1 100% 0% 2
5 FLOWING LIKE PROFILE Author keyword 1 100% 0% 2
6 LPCVD SILICON NITRIDE Author keyword 1 50% 0% 2
7 PLASMA DEPOSITED OXIDES Author keyword 1 100% 0% 2
8 QAS Address 1 100% 0% 2
9 SINCO4 Author keyword 1 100% 0% 2
10 TEOS O 3 Author keyword 1 100% 0% 2

Web of Science journal categories

Author Key Words


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class		 LCSH search Wikipedia search
1 BOROPHOSPHOSILICATE GLASS BPSG 2 67% 0% 2 Search BOROPHOSPHOSILICATE+GLASS+BPSG Search BOROPHOSPHOSILICATE+GLASS+BPSG
2 ATMOSPHERIC PRESSURE CVD 2 27% 1% 6 Search ATMOSPHERIC+PRESSURE+CVD Search ATMOSPHERIC+PRESSURE+CVD
3 BPSG 2 22% 1% 7 Search BPSG Search BPSG
4 FLOW SHAPED STEP COVERAGE 1 100% 0% 2 Search FLOW+SHAPED+STEP+COVERAGE Search FLOW+SHAPED+STEP+COVERAGE
5 FLOWING LIKE PROFILE 1 100% 0% 2 Search FLOWING+LIKE+PROFILE Search FLOWING+LIKE+PROFILE
6 LPCVD SILICON NITRIDE 1 50% 0% 2 Search LPCVD+SILICON+NITRIDE Search LPCVD+SILICON+NITRIDE
7 PLASMA DEPOSITED OXIDES 1 100% 0% 2 Search PLASMA+DEPOSITED+OXIDES Search PLASMA+DEPOSITED+OXIDES
8 SINCO4 1 100% 0% 2 Search SINCO4 Search SINCO4
9 TEOS O 3 1 100% 0% 2 Search TEOS+O+3 Search TEOS+O+3
10 TETRAETHYLORTHOSILICATE 1 11% 1% 7 Search TETRAETHYLORTHOSILICATE Search TETRAETHYLORTHOSILICATE

Key Words Plus


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 LOW TEMPERATURE REFLOW 27 92% 2% 11
2 BOROPHOSPHOSILICATE GLASS 25 66% 3% 23
3 TEOS 13 21% 8% 55
4 PHOSPHOSILICATE GLASS 13 62% 2% 13
5 BOROPHOSPHOSILICATE GLASS FILMS 10 73% 1% 8
6 TETRAETHYLORTHOSILICATE 10 23% 5% 37
7 FLOW POINTS 6 80% 1% 4
8 BASE MATERIALS 5 27% 3% 17
9 LOW PRESSURE DEPOSITION 4 31% 2% 12
10 TETRAETHYLORTHOSILICATE TEOS 4 67% 1% 4

Journals

Reviews


Title Publ. year Cit. Active
references		 % act. ref.
to same field
PROCESS AND FILM CHARACTERIZATION OF LOW-PRESSURE TETRAETHYLORTHOSILICATE-BOROPHOSPHOSILICATE GLASS 1986 69 26 85%
CVD of SiO2 and related materials: An overview 1996 14 37 51%
Chemical vapour deposition of thin film dielectrics 2005 2 52 40%
LOW-TEMPERATURE CHEMICAL-VAPOR-DEPOSITION PROCESSES AND DIELECTRICS FOR MICROELECTRONIC CIRCUIT MANUFACTURING AT IBM 1995 19 60 20%
Pyrolysis of tetraethoxysilane on Mo(100) at low temperatures 1998 5 66 29%
INFRARED SPECTROSCOPIC TECHNIQUES FOR QUANTITATIVE CHARACTERIZATION OF DIELECTRIC THIN-FILMS ON SILICON-WAFERS 1994 11 87 24%

Address terms


Rank Address term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class
1 QAS 1 100% 0.3% 2
2 SUR E CONDITIONING 1 50% 0.1% 1
3 ADV MEMORY DEV 1 16% 0.4% 3
4 ADV PROD RD 0 33% 0.1% 1
5 CUSTOMER PLICAT GRP 0 33% 0.1% 1
6 OBERFLACHENTECHNIK PLASMATECH WERKSTOFFENT 0 33% 0.1% 1
7 SEMICOND DEVICES MICROELECT 0 33% 0.1% 1
8 CNRSUMR 6122 0 25% 0.1% 1
9 ADV CUSTOM TECHNOL 0 20% 0.1% 1
10 ADV MEMORY PROD DEV 0 20% 0.1% 1

Related classes at same level (level 1)


Rank Relatedness score Related classes
1 0.0000159298 SILICON TETRAACETATE//F 2 LASER//N2O GAS
2 0.0000149835 CHARGED NANOPARTICLES//SASAKI TEAM//MICROSTRUCT SCI MAT
3 0.0000143226 HMDSO//HEXAMETHYLDISILOXANE//HEXAMETHYLDISILOXANE HMDSO
4 0.0000118114 SPRAY ETCHING//ETCH FACTOR//ETCHING FACTOR
5 0.0000112512 CVD W//FEATURE SCALE MODEL//FOCUS NEW YORK
6 0.0000112242 HITACHI ADM//SOLAR CELL METALLIZATION//
7 0.0000105886 LASER POLISHING//SELF ION ASSISTED DEPOSITION//QUASISTATIC PROBLEM OF THERMOELASTICITY
8 0.0000087740 SILICON OXYNITRIDE//SILICON NITRIDE FILMS//CONDUCTANCE TRANSIENTS
9 0.0000077820 ELECTRICAL PASSIVATION OF STRUCTURAL DEFECTS//GAAS DIODE//TRIPLE CRYSTAL DIFFRACTOMETRY
10 0.0000068377 FIRE RADIOMETER//OPTO THERMAL RADIOMETRY//INFRARED EMISSION SPECTROMETRY