Class information for:
Level 1: SCANNING//SECONDARY EMISSION NOISE//INTEGRATED CIRCUIT ADV PROC TECHNOL

Basic class information
ID Publications Average number
of references		 Avg. shr. active
ref. in WoS
14436 704 16.3 39%


Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 2)


ID, lev.
above		 Publications Label for level above
2051 4868 SCANNING//LAMACOP//BACKSCATTERED ELECTRONS

Terms with highest relevance score


Rank Term Type of term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 SCANNING Journal 19 11% 24% 166
2 SECONDARY EMISSION NOISE Author keyword 8 100% 1% 5
3 INTEGRATED CIRCUIT ADV PROC TECHNOL Address 6 100% 1% 4
4 DIGITAL SCAN Author keyword 4 75% 0% 3
5 STEREO PAIR TECHNIQUE Author keyword 4 75% 0% 3
6 BEASTLI Author keyword 3 100% 0% 3
7 CONTRAST TO GRADIENT Author keyword 3 100% 0% 3
8 MASK ENGN GRP Address 3 100% 0% 3
9 RELIEF ELEMENTS Author keyword 3 100% 0% 3
10 DEEP UV MICROSCOPE Author keyword 3 60% 0% 3

Web of Science journal categories

Author Key Words


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class		 LCSH search Wikipedia search
1 SECONDARY EMISSION NOISE 8 100% 1% 5 Search SECONDARY+EMISSION+NOISE Search SECONDARY+EMISSION+NOISE
2 DIGITAL SCAN 4 75% 0% 3 Search DIGITAL+SCAN Search DIGITAL+SCAN
3 STEREO PAIR TECHNIQUE 4 75% 0% 3 Search STEREO+PAIR+TECHNIQUE Search STEREO+PAIR+TECHNIQUE
4 BEASTLI 3 100% 0% 3 Search BEASTLI Search BEASTLI
5 CONTRAST TO GRADIENT 3 100% 0% 3 Search CONTRAST+TO+GRADIENT Search CONTRAST+TO+GRADIENT
6 RELIEF ELEMENTS 3 100% 0% 3 Search RELIEF+ELEMENTS Search RELIEF+ELEMENTS
7 DEEP UV MICROSCOPE 3 60% 0% 3 Search DEEP+UV+MICROSCOPE Search DEEP+UV+MICROSCOPE
8 ACTIVE IMAGE PROCESSING 2 67% 0% 2 Search ACTIVE+IMAGE+PROCESSING Search ACTIVE+IMAGE+PROCESSING
9 AREA AND PERIMETER 2 67% 0% 2 Search AREA+AND+PERIMETER Search AREA+AND+PERIMETER
10 LAGRANGE TIME DELAY 2 67% 0% 2 Search LAGRANGE+TIME+DELAY Search LAGRANGE+TIME+DELAY

Key Words Plus


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class
1 SHARPNESS MEASUREMENT 18 89% 1% 8
2 ACCELERATING VOLTAGE 12 86% 1% 6
3 ASTIGMATISM CORRECTION METHOD 11 100% 1% 6
4 LAPLACIAN FILTER 11 100% 1% 6
5 MASK METROLOGY 6 71% 1% 5
6 SEM IMAGES 5 47% 1% 8
7 LINEWIDTH MEASUREMENT 4 41% 1% 7
8 INTEGRATED CIRCUIT TECHNOLOGY 3 60% 0% 3
9 SIGNAL FORMATION 2 44% 1% 4
10 DIFFUSION MATRIX 2 67% 0% 2

Journals


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 SCANNING 19 11% 24% 166

Reviews


Title Publ. year Cit. Active
references		 % act. ref.
to same field
TSEM: A Review of Scanning Electron Microscopy in Transmission Mode and Its Applications 2012 7 73 34%
CRITICAL ISSUES IN SCANNING ELECTRON-MICROSCOPE METROLOGY 1994 30 48 48%
Model-based SEM for dimensional metrology tasks in semiconductor and mask industry 2009 12 45 31%
BACKSCATTERED ELECTRON IMAGING USING SINGLE-CRYSTAL SCINTILLATOR DETECTORS 1989 25 33 58%
Introduction to image processing 1998 2 1 100%
Three-dimensional characterization of drug-encapsulating particles using STEM detector in FEG-SEM 2009 7 9 22%
SHAPE FROM SHADING USING MULTIPLE DETECTOR SIGNALS IN SCANNING ELECTRON-MICROSCOPY 1987 32 16 56%
DETECTION OF TOPOGRAPHIC CONTRAST IN THE SCANNING ELECTRON-MICROSCOPE AT LOW AND MEDIUM RESOLUTION BY DIFFERENT DETECTORS AND DETECTOR SYSTEMS 1994 4 38 71%
Digital image-processing technology useful for scanning, electron microscopy and its practical applications 2002 0 46 85%
Imaging of carbon nanotubes with tin-palladium particles using STEM detector in a FE-SEM 2007 11 5 20%

Address terms


Rank Address term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class
1 INTEGRATED CIRCUIT ADV PROC TECHNOL 6 100% 0.6% 4
2 MASK ENGN GRP 3 100% 0.4% 3
3 ELECT BEAM 1 50% 0.1% 1
4 TECHNOL MFG GRP J AN 1 50% 0.1% 1
5 NAKA 1 11% 0.9% 6
6 CICFAR 1 12% 0.6% 4
7 NANOTECHNOL PROD BUSINESS GRP 0 14% 0.4% 3
8 AUDITORY VISUAL INFORMAT SECT 0 33% 0.1% 1
9 CD METROL 0 33% 0.1% 1
10 PROBLEMS MICROELECT TECHNOL HIGHLY PURE MA 0 33% 0.1% 1

Related classes at same level (level 1)


Rank Relatedness score Related classes
1 0.0000251375 MEAN PENETRATION DEPTH//CONTINUOUS SLOWING DOWN APPROXIMATION//DOPANT CONTRAST
2 0.0000166932 ELECTRON BEAM TESTING//SOREP//VOLTAGE CONTRAST
3 0.0000156807 ENVIRONMENTAL SCANNING ELECTRON MICROSCOPE//ENVIRONMENTAL SEM//VARIABLE PRESSURE SCANNING ELECTRON MICROSCOPE
4 0.0000130178 LOW TEMPERATURE SEM//CYTOPLASMIC MATRIX//DOUBLE LAYER COATING
5 0.0000107090 LAMACOP//SECONDARY ELECTRON EMISSION//ALUMINA INSULATOR
6 0.0000096221 HIRANO BODIES//HIRANO BODY//INTRANEURONAL INCLUSIONS
7 0.0000094365 APERTURE ABERRATION//CORE LENS//CURVED OPTIC AXIS
8 0.0000093628 OPTICAL SCATTEROMETRY//DIMENSIONAL STANDARDS//LINEWIDTH MONITORING
9 0.0000077380 TIP CHARACTERIZATION//TIP CHARACTERIZER//SIDEWALL MEASUREMENT
10 0.0000074699 LASER INTERFERENCE MICROSCOPY//COHERENT PHASE MICROSCOPY//DYNAMIC PHASE MICROSCOPY