Class information for:
Level 1: CVD W//FEATURE SCALE MODEL//FOCUS NEW YORK

Basic class information
ID Publications Average number
of references		 Avg. shr. active
ref. in WoS
13042 800 19.6 50%


Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 2)


ID, lev.
above		 Publications Label for level above
1792 5778 DIFFUSION BARRIER//ELECTROMIGRATION//CU METALLIZATION

Terms with highest relevance score


Rank Term Type of term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class
1 CVD W Author keyword 6 58% 1% 7
2 FEATURE SCALE MODEL Author keyword 3 57% 1% 4
3 FOCUS NEW YORK Address 2 25% 1% 8
4 BLANKET TUNGSTEN Author keyword 2 67% 0% 2
5 SINGLE WAFER REACTOR Author keyword 2 67% 0% 2
6 BEREICH BAUELEMENTETECHNOL Address 2 50% 0% 3
7 SOLID STATE ELE Address 2 22% 1% 6
8 GEN PHYS LASER SPECT Address 1 38% 0% 3
9 CVD IRON Author keyword 1 100% 0% 2
10 EFFECTIVE REACTIVITY MAP Author keyword 1 100% 0% 2

Web of Science journal categories

Author Key Words


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class		 LCSH search Wikipedia search
1 CVD W 6 58% 1% 7 Search CVD+W Search CVD+W
2 FEATURE SCALE MODEL 3 57% 1% 4 Search FEATURE+SCALE+MODEL Search FEATURE+SCALE+MODEL
3 BLANKET TUNGSTEN 2 67% 0% 2 Search BLANKET+TUNGSTEN Search BLANKET+TUNGSTEN
4 SINGLE WAFER REACTOR 2 67% 0% 2 Search SINGLE+WAFER+REACTOR Search SINGLE+WAFER+REACTOR
5 CVD IRON 1 100% 0% 2 Search CVD+IRON Search CVD+IRON
6 EFFECTIVE REACTIVITY MAP 1 100% 0% 2 Search EFFECTIVE+REACTIVITY+MAP Search EFFECTIVE+REACTIVITY+MAP
7 REACTOR SCALE MODEL 1 100% 0% 2 Search REACTOR+SCALE+MODEL Search REACTOR+SCALE+MODEL
8 SELECTIVITY LOSS 1 50% 0% 2 Search SELECTIVITY+LOSS Search SELECTIVITY+LOSS
9 SEMICONDUCTOR PROCESS SIMULATION 1 50% 0% 2 Search SEMICONDUCTOR+PROCESS+SIMULATION Search SEMICONDUCTOR+PROCESS+SIMULATION
10 SUBMICROMETER TRENCHES 1 100% 0% 2 Search SUBMICROMETER+TRENCHES Search SUBMICROMETER+TRENCHES

Key Words Plus


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 WF6 30 54% 5% 38
2 LPCVD TUNGSTEN 21 78% 2% 14
3 TUNGSTEN SILICIDE FILMS 21 90% 1% 9
4 STEP COVERAGE 17 29% 6% 48
5 SINGLE WAFER REACTOR 11 44% 2% 19
6 FEATURE SCALE 11 100% 1% 6
7 SILICON REDUCTION 9 83% 1% 5
8 TUNGSTEN LPCVD 8 75% 1% 6
9 RECTANGULAR TRENCHES 7 46% 1% 11
10 SELECTIVE TUNGSTEN 6 80% 1% 4

Journals

Reviews


Title Publ. year Cit. Active references % act. ref.
to same field
METAL CVD FOR MICROELECTRONIC APPLICATIONS - AN EXAMINATION OF SURFACE-CHEMISTRY AND KINETICS 1993 60 123 40%
Electron spectroscopic analysis of the SiO2/Si system and correlation with metal-oxide-semiconductor device characteristics 1996 245 99 10%
CHEMICAL-VAPOR-DEPOSITION OF METALS .1. AN OVERVIEW OF CVD PROCESSES 1995 99 130 18%
Topography simulation for the virtual wafer fab 2000 23 78 31%
LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION OF TUNGSTEN AND ALUMINUM FOR VLSI APPLICATIONS 1987 37 21 52%
Multiscale modeling of thin film growth 1998 40 49 12%
SELECTIVE TUNGSTEN PROCESSING BY LOW-PRESSURE CVD 1985 47 13 77%
SELECTIVE VAPOR-PHASE DEPOSITION ON PATTERNED SUBSTRATES 1990 28 133 29%
CHEMICAL VAPOR-DEPOSITION OF METALS FOR INTEGRATED-CIRCUIT APPLICATIONS 1985 42 28 46%
A REVIEW OF LPCVD METALLIZATION FOR SEMICONDUCTOR-DEVICES 1985 16 21 38%

Address terms


Rank Address term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class
1 FOCUS NEW YORK 2 25% 1.0% 8
2 BEREICH BAUELEMENTETECHNOL 2 50% 0.4% 3
3 SOLID STATE ELE 2 22% 0.8% 6
4 GEN PHYS LASER SPECT 1 38% 0.4% 3
5 FOCUS NEW YORK RENSSELAER INTERCONNECT GIGASC 1 100% 0.3% 2
6 ANALYT MAT PHYS 1 33% 0.4% 3
7 DIRECT MET BUSINESS UNIT 1 50% 0.1% 1
8 FAB25 THIN FILM MODULE 1 50% 0.1% 1
9 LOW ENERGY LSI DEV PROJECT 1 50% 0.1% 1
10 TCAD MICROELECT 1 50% 0.1% 1

Related classes at same level (level 1)


Rank Relatedness score Related classes
1 0.0000261336 TUNGSTEN NITRIDE//WNX//GRP MAT ENGN SUPERFICIES
2 0.0000133474 PARASITIC REACTION//CVD REACTOR//MOCVD REACTOR
3 0.0000125717 W TI THIN FILMS//WTI THIN FILMS//SURFACE LASER TREATMENT
4 0.0000124653 LASER MICRO CLADDING//FREEFORM FABRICAT S//DIMETHYLALUMINUM HYDRIDE
5 0.0000112512 BOROPHOSPHOSILICATE GLASS BPSG//ATMOSPHERIC PRESSURE CVD//BPSG
6 0.0000104902 TISI2//SALICIDE//NICKEL SILICIDE
7 0.0000089611 ELECTROCHEMICAL VAPOR DEPOSITION//BETA DIKETONE METAL CHELATES//COLD PLASMA PROCESS
8 0.0000087593 CROSS BRIDGE KELVIN RESISTOR CBKR//CROSS KELVIN RESISTOR CKR//CROSS BRIDGE KELVIN RESISTOR
9 0.0000087103 TINX FILMS//MAT CHEM COATINGS//TDEAT
10 0.0000086826 PERFLUORINATED CARBOXYLATES//COPPER CVD//IR AND NMR