Class information for:
Level 1: SIH2//SIH3//SILANE PLASMA

Basic class information
ID Publications Average number
of references		 Avg. shr. active
ref. in WoS
12869 813 22.8 62%


Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 2)


ID, lev.
above		 Publications Label for level above
252 19240 MICROCRYSTALLINE SILICON//JOURNAL OF NON-CRYSTALLINE SOLIDS//PHOTOVOLTA THIN FILM ELECT

Terms with highest relevance score


Rank Term Type of term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class
1 SIH2 Author keyword 5 44% 1% 8
2 SIH3 Author keyword 4 67% 0% 4
3 SILANE PLASMA Author keyword 4 33% 1% 9
4 THERMODYNAMIC AND KINETIC STUDIES Author keyword 3 60% 0% 3
5 ELECTRON CYCLOTRON RESONANCE PLASMA CHEMICAL VAPOR DEPOSITION Author keyword 2 67% 0% 2
6 RF PLASMA CHEMICAL VAPOR DEPOSITION Author keyword 2 67% 0% 2
7 SIH3 RADICAL Author keyword 2 67% 0% 2
8 URA 304 Address 2 67% 0% 2
9 VERY HIGH FREQUENCY CAPACITIVELY COUPLED PLASMA Author keyword 2 67% 0% 2
10 DILUTION GAS Author keyword 1 38% 0% 3

Web of Science journal categories

Author Key Words


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class		 LCSH search Wikipedia search
1 SIH2 5 44% 1% 8 Search SIH2 Search SIH2
2 SIH3 4 67% 0% 4 Search SIH3 Search SIH3
3 SILANE PLASMA 4 33% 1% 9 Search SILANE+PLASMA Search SILANE+PLASMA
4 THERMODYNAMIC AND KINETIC STUDIES 3 60% 0% 3 Search THERMODYNAMIC+AND+KINETIC+STUDIES Search THERMODYNAMIC+AND+KINETIC+STUDIES
5 ELECTRON CYCLOTRON RESONANCE PLASMA CHEMICAL VAPOR DEPOSITION 2 67% 0% 2 Search ELECTRON+CYCLOTRON+RESONANCE+PLASMA+CHEMICAL+VAPOR+DEPOSITION Search ELECTRON+CYCLOTRON+RESONANCE+PLASMA+CHEMICAL+VAPOR+DEPOSITION
6 RF PLASMA CHEMICAL VAPOR DEPOSITION 2 67% 0% 2 Search RF+PLASMA+CHEMICAL+VAPOR+DEPOSITION Search RF+PLASMA+CHEMICAL+VAPOR+DEPOSITION
7 SIH3 RADICAL 2 67% 0% 2 Search SIH3+RADICAL Search SIH3+RADICAL
8 VERY HIGH FREQUENCY CAPACITIVELY COUPLED PLASMA 2 67% 0% 2 Search VERY+HIGH+FREQUENCY+CAPACITIVELY+COUPLED+PLASMA Search VERY+HIGH+FREQUENCY+CAPACITIVELY+COUPLED+PLASMA
9 DILUTION GAS 1 38% 0% 3 Search DILUTION+GAS Search DILUTION+GAS
10 ION INDUCED REACTION 1 50% 0% 2 Search ION+INDUCED+REACTION Search ION+INDUCED+REACTION

Key Words Plus


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 SILANE PLASMA 12 27% 5% 38
2 SIH3 RADICALS 8 100% 1% 5
3 GLOW DISCHARGE DEPOSITION 7 50% 1% 10
4 FILM PRODUCING RADICALS 6 80% 0% 4
5 DISCHARGE SILANE PLASMA 6 71% 1% 5
6 HYDRIDE COMPOSITION 6 53% 1% 8
7 RADICAL DEPOSITION 6 100% 0% 4
8 PLASMA INDUCED DEPOSITION 5 47% 1% 8
9 GROWING SURFACE 5 63% 1% 5
10 RADIOFREQUENCY SILANE PLASMA 5 63% 1% 5

Journals

Reviews


Title Publ. year Cit. Active references % act. ref.
to same field
An accurate description of the ground and excited states of SiH 2002 18 75 45%
Growth of hydrogenated amorphous silicon and its alloys 1997 2 32 41%
Highly cross-linked polymer networks of amorphous silicon alloys: Quantum chemical studies on plasma and photochemical processes 1996 0 64 50%
GAS-PHASE CHEMISTRY IN THE PROCESSING OF MATERIALS FOR THE SEMICONDUCTOR INDUSTRY 1988 18 118 19%

Address terms


Rank Address term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class
1 URA 304 2 67% 0.2% 2
2 PRIAM 1 27% 0.5% 4
3 CENIMATUNINOVA 1 50% 0.1% 1
4 ELECT ENERGY CONVERS UNIT DIMES 1 50% 0.1% 1
5 PLASMA COUCHES MINCES 1 50% 0.1% 1
6 URA 196 1 50% 0.1% 1
7 PLASMA PHYS RADIAT TECHNOL 1 13% 0.5% 4
8 CHIM PHYS CNRS URA 176 0 33% 0.1% 1
9 PHYS COUCHES MINCES 0 33% 0.1% 1
10 FOR UNGSZENTRUM ISI PV 0 25% 0.1% 1

Related classes at same level (level 1)


Rank Relatedness score Related classes
1 0.0000249636 MICROCRYSTALLINE SILICON//SID PHYS DEVICES//MU C SI H
2 0.0000220374 DUST PARTICLE GROWTH//CNRS LPICM//PARTICLE CHARGE DISTRIBUTION
3 0.0000201905 CASCADED ARC//CHARGE STRIPPER//PLASMA WINDOW
4 0.0000161455 GERMANIUM CARBON//A SIGE//GE1 XCX
5 0.0000154869 LADDER SILICONE SPIN ON GLASS LS SOG//POLYSILOXENE BASED FILM//SIO2 PATTERN GENERATION
6 0.0000149898 STAEBLER WRONSKI EFFECT//HYDROGENATED AMORPHOUS SILICON//SOLAR CELLS
7 0.0000138326 1 3 DISILACYCLOBUTANE//LASER CHEM GRP//SPIRO SI HETEROCYCLIC RING COMPOUND
8 0.0000131684 SILICON TETRAACETATE//F 2 LASER//N2O GAS
9 0.0000103183 A SIH A SIGEH//AMORPHOUS SILICON BASED ALLOY//DIP SCI MAT TERRA
10 0.0000082843 LADDER SHAPED ELECTRODE//PLASMA ATOM PHYS//VHF PLASMA