Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
12737 | 821 | 16.7 | 57% |
Classes in level above (level 2) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
138 | 22619 | IEEE TRANSACTIONS ON ELECTRON DEVICES//IEEE ELECTRON DEVICE LETTERS//SOLID-STATE ELECTRONICS |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | DIRECT TUNNELING | Author keyword | 10 | 28% | 4% | 29 |
2 | QUANTUM MECHANICAL EFFECTS QMES | Author keyword | 8 | 100% | 1% | 5 |
3 | WAVE FUNCTION PENETRATION | Author keyword | 8 | 62% | 1% | 8 |
4 | DIRECT TUNNELING CURRENT | Author keyword | 7 | 64% | 1% | 7 |
5 | LEHRSTUHL HALBLEITERTECH | Address | 7 | 53% | 1% | 9 |
6 | QUANTUM MECHANICAL EFFECTS | Author keyword | 6 | 29% | 2% | 19 |
7 | MOS TUNNEL DIODE | Author keyword | 6 | 80% | 0% | 4 |
8 | MOS TUNNEL STRUCTURE | Author keyword | 6 | 80% | 0% | 4 |
9 | QUANTUM MECHANICAL EFFECT | Author keyword | 6 | 44% | 1% | 11 |
10 | DIRECT TUNNELING DT | Author keyword | 6 | 71% | 1% | 5 |
Web of Science journal categories |
Author Key Words |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | ULTRA THIN OXIDE | 25 | 71% | 2% | 20 |
2 | DIRECT TUNNELING CURRENT | 10 | 44% | 2% | 18 |
3 | WAVE FUNCTION PENETRATION | 9 | 64% | 1% | 9 |
4 | POLYSILICON QUANTIZATION | 9 | 83% | 1% | 5 |
5 | EMITTER TRANSISTORS | 6 | 80% | 0% | 4 |
6 | INVERSION LAYER | 6 | 16% | 4% | 33 |
7 | SIO2 GATE OXIDES | 5 | 50% | 1% | 7 |
8 | THIN OXIDE | 5 | 29% | 2% | 14 |
9 | TUNNELING CURRENT | 4 | 15% | 3% | 26 |
10 | EMITTER TRANSISTOR | 4 | 75% | 0% | 3 |
Journals |
Reviews |
Title | Publ. year | Cit. | Active references |
% act. ref. to same field |
---|---|---|---|---|
Extrinsic and Intrinsic Frequency Dispersion of High-k Materials in Capacitance-Voltage Measurements | 2012 | 12 | 51 | 37% |
Tunneling through ultrathin SiO2 gate oxides from microscopic models | 2001 | 72 | 63 | 29% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | LEHRSTUHL HALBLEITERTECH | 7 | 53% | 1.1% | 9 |
2 | LASSIDTI | 4 | 75% | 0.4% | 3 |
3 | CPR ND | 3 | 60% | 0.4% | 3 |
4 | SI NANO DEVICE | 2 | 67% | 0.2% | 2 |
5 | ELEKT BAUELEMENTE ALTUNGSTECH | 1 | 38% | 0.4% | 3 |
6 | LEHRSTUHL HALBLEITERTECHN | 1 | 50% | 0.2% | 2 |
7 | NETZWERKTHEORIE ALTUNGSTECH | 1 | 100% | 0.2% | 2 |
8 | INTEGRATED CIRCUITS | 1 | 11% | 1.3% | 11 |
9 | FIS DISPOSITIVOS MICROELECT | 1 | 40% | 0.2% | 2 |
10 | ADV MEMORY DEVICE TECHNOL | 1 | 50% | 0.1% | 1 |
Related classes at same level (level 1) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000197716 | STRESS INDUCED LEAKAGE CURRENT//SOFT BREAKDOWN//DIELECTRIC BREAKDOWN BD |
2 | 0.0000194575 | CONFOCAL SYSTEMS//MICROWAVE PHOTOCONDUCTIVITY//MIS SWITCHING DEVICES |
3 | 0.0000183314 | MOS TUNNELING DIODE//ELECTRON HOLE PLASMA RECOMBINATION//LATERAL NONUNIFORMITY LNU |
4 | 0.0000173656 | NETWORK COMPUTAT NANOTECHNOL//QUASI BALLISTIC TRANSPORT//JOURNAL OF COMPUTATIONAL ELECTRONICS |
5 | 0.0000122238 | CRYOGENIC CMOS//LOW TEMPERATURE ELECTRONICS//LOW TEMPERATURE CIRCUIT |
6 | 0.0000113200 | DOUBLE GATE MOSFET//FINFET//SHORT CHANNEL EFFECTS |
7 | 0.0000103896 | BORON PENETRATION//REMOTE PLASMA NITRIDATION RPN//SI NITRIDE |
8 | 0.0000100135 | HFO2//HIGH K//METAL GATE |
9 | 0.0000100038 | DEVICE MODELLING GRP//RANDOM DOPANT//DEVICE MODELING GRP |
10 | 0.0000086921 | NONQUASI STATIC NQS EFFECT//QUCS//RSCE |