Class information for:
Level 1: TINX FILMS//MAT CHEM COATINGS//TDEAT

Basic class information
ID Publications Average number
of references		 Avg. shr. active
ref. in WoS
12291 852 20.5 55%


Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 2)


ID, lev.
above		 Publications Label for level above
303 17862 SURFACE & COATINGS TECHNOLOGY//PLASMA NITRIDING//EXPANDED AUSTENITE

Terms with highest relevance score


Rank Term Type of term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 TINX FILMS Author keyword 9 83% 1% 5
2 MAT CHEM COATINGS Address 6 80% 0% 4
3 TDEAT Author keyword 6 71% 1% 5
4 OBERFLACHENTECH PLASMATECH WERKSTOFFENTWIC Address 5 34% 1% 11
5 TDMAT Author keyword 4 50% 1% 6
6 PACVD Author keyword 4 15% 3% 25
7 ALKOXIDE SOLUTION Author keyword 3 50% 0% 4
8 DIGITAL SEMICOND Address 2 67% 0% 2
9 OBERFLACHENTECHNIK PLASMATECH WERKSTOFFENT Address 2 67% 0% 2
10 TETRAISOPROPOXYTITANIUM Author keyword 2 67% 0% 2

Web of Science journal categories

Author Key Words


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class		 LCSH search Wikipedia search
1 TINX FILMS 9 83% 1% 5 Search TINX+FILMS Search TINX+FILMS
2 TDEAT 6 71% 1% 5 Search TDEAT Search TDEAT
3 TDMAT 4 50% 1% 6 Search TDMAT Search TDMAT
4 PACVD 4 15% 3% 25 Search PACVD Search PACVD
5 ALKOXIDE SOLUTION 3 50% 0% 4 Search ALKOXIDE+SOLUTION Search ALKOXIDE+SOLUTION
6 TETRAISOPROPOXYTITANIUM 2 67% 0% 2 Search TETRAISOPROPOXYTITANIUM Search TETRAISOPROPOXYTITANIUM
7 PULSED DC PLASMA 2 43% 0% 3 Search PULSED+DC+PLASMA Search PULSED+DC+PLASMA
8 CVD TIN 1 38% 0% 3 Search CVD+TIN Search CVD+TIN
9 HIGH SPEED DEPOSITION 1 38% 0% 3 Search HIGH+SPEED+DEPOSITION Search HIGH+SPEED+DEPOSITION
10 DYNAMIC ION INTERMIXING 1 100% 0% 2 Search DYNAMIC+ION+INTERMIXING Search DYNAMIC+ION+INTERMIXING

Key Words Plus


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 TETRAKISDIMETHYLAMIDOTITANIUM 30 64% 3% 29
2 TICL4 NH3 H 2 15 82% 1% 9
3 TETRAKIS DIMETHYLAMINO TITANIUM 13 80% 1% 8
4 TITANIUM NITRIDE 13 10% 14% 117
5 LPCVD TITANIUM NITRIDE 11 69% 1% 9
6 TDMAT 11 69% 1% 9
7 AMIDO TITANIUM 8 100% 1% 5
8 PA CVD 8 100% 1% 5
9 TETRAKISDIMETHYLAMIDO TITANIUM 8 100% 1% 5
10 BARRIER METALLIZATION 8 62% 1% 8

Journals

Reviews


Title Publ. year Cit. Active references % act. ref.
to same field
CVD and precursor chemistry of transition metal nitrides 2013 16 164 29%
TITANIUM NITRIDE FILMS AND THEIR PREPARATION FROM TETRAKIS (DIMETHYLAMIDO)TITANIUM 1994 2 17 82%
Development of CVD Ti-containing films 2013 3 218 13%
Corrosion protection by chemical vapor deposition: A review 2005 2 26 27%
Quantum modeling of the CVD of transition metal materials 1997 4 58 12%

Address terms


Rank Address term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 MAT CHEM COATINGS 6 80% 0.5% 4
2 OBERFLACHENTECH PLASMATECH WERKSTOFFENTWIC 5 34% 1.3% 11
3 DIGITAL SEMICOND 2 67% 0.2% 2
4 OBERFLACHENTECHNIK PLASMATECH WERKSTOFFENT 2 67% 0.2% 2
5 CHEM CRYSTALLOG SERV 1 50% 0.1% 1
6 CORROS TECHNOL ELE OCHEM SPECT 1 50% 0.1% 1
7 GRP PLASMA PHYS TECHNOL 1 50% 0.1% 1
8 IND FERTIGUNG FABRIKBETRIEB IFF 1 50% 0.1% 1
9 NW SERV OFF 1 50% 0.1% 1
10 OBERFLACHENTECH PLASMATECHN WERKSTOFFENTWI 1 50% 0.1% 1

Related classes at same level (level 1)


Rank Relatedness score Related classes
1 0.0000211450 TITANIUM NITRIDE//ZIRCONIUM NITRIDE//ZIRCONIUM OXYNITRIDE
2 0.0000120294 SOLID STATE METATHESIS//TITANIUM PELLET//AFTERBURNING COMBUSTION
3 0.0000112042 DIFFUSION BARRIER//CU METALLIZATION//TANTALUM NITRIDE
4 0.0000098566 TUNGSTEN NITRIDE//WNX//GRP MAT ENGN SUPERFICIES
5 0.0000093115 TI B N//TITANIUM DIBORIDE COATING//TIBN
6 0.0000087103 CVD W//FEATURE SCALE MODEL//FOCUS NEW YORK
7 0.0000085000 KAPPA AL2O3//ALUMINA COATINGS//COMBUSTION CHEMICAL VAPOR DEPOSITION
8 0.0000078932 ATOMIC LAYER DEPOSITION//MOLECULAR LAYER DEPOSITION MLD//MOLECULAR LAYER DEPOSITION
9 0.0000073099 ISOTHERMAL CHEMICAL VAPOR INFILTRATION//PRESSURE PULSED CHEMICAL VAPOR INFILTRATION//3D IMAGE BASED MODELING
10 0.0000068079 CHROMIUM NITRIDE//TIALN//SUPERHARDNESS EFFECT