Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
12268 | 854 | 15.5 | 55% |
Classes in level above (level 2) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
512 | 14399 | PLASMA SOURCES SCIENCE & TECHNOLOGY//PLASMA DISPLAY PANEL PDP//PLASMA DISPLAY PANEL |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | ECR PLASMA | Author keyword | 25 | 31% | 8% | 67 |
2 | UNIFORM PLASMA | Author keyword | 7 | 64% | 1% | 7 |
3 | MAGNETIC MULTIPOLE FIELD | Author keyword | 6 | 80% | 0% | 4 |
4 | ELECTRON CYCLOTRON RESONANCE DISCHARGE | Author keyword | 6 | 71% | 1% | 5 |
5 | ECR POSITION | Author keyword | 6 | 100% | 0% | 4 |
6 | UPPER HYBRID RESONANCE | Author keyword | 5 | 60% | 1% | 6 |
7 | LOW ELECTRON TEMPERATURE PLASMA | Author keyword | 5 | 63% | 1% | 5 |
8 | ELECTRON CYCLOTRON WAVE | Author keyword | 4 | 46% | 1% | 6 |
9 | AR N 2 MIXTURE | Author keyword | 3 | 100% | 0% | 3 |
10 | ELECTRON IMPACT CROSS SECTION | Author keyword | 3 | 100% | 0% | 3 |
Web of Science journal categories |
Author Key Words |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | ECR ION | 18 | 89% | 1% | 8 |
2 | TE01 MODE MICROWAVE | 6 | 100% | 0% | 4 |
3 | ELECTRON CYCLOTRON RESONANCE | 5 | 14% | 4% | 36 |
4 | ADVANCED PLASMA SOURCES | 4 | 75% | 0% | 3 |
5 | ETCHING APPLICATIONS | 4 | 75% | 0% | 3 |
6 | ECR PLASMA | 3 | 27% | 1% | 11 |
7 | MICROWAVE PLASMA CATHODE | 3 | 100% | 0% | 3 |
8 | MICROWAVE ION SOURCE | 3 | 42% | 1% | 5 |
9 | MODE MICROWAVE | 2 | 67% | 0% | 2 |
10 | ECR ION SOURCE | 2 | 23% | 1% | 6 |
Journals |
Reviews |
Title | Publ. year | Cit. | Active references |
% act. ref. to same field |
---|---|---|---|---|
The design and application of electron cyclotron resonance discharges | 1997 | 30 | 78 | 63% |
PHYSICAL LIMITATIONS OF MINIMUM SIZES OF THE ELEMENTS OF MODERN MICROELECTRONICS | 1984 | 10 | 5 | 20% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | KASADO WORKS | 1 | 27% | 0.4% | 3 |
2 | ELECT COMP ENGN 1406 W GREEN ST | 1 | 50% | 0.1% | 1 |
3 | KASADO DESIGN PROD | 1 | 50% | 0.1% | 1 |
4 | SCI PL MECH ELE ODYNAM | 1 | 50% | 0.1% | 1 |
5 | CALCULAT MATH CYBERNET | 0 | 33% | 0.1% | 1 |
6 | ELE OSTAT MAT DIELE | 0 | 33% | 0.1% | 1 |
7 | ACELERADOR TANDEM | 0 | 25% | 0.1% | 1 |
8 | VLSI MFG ENGN | 0 | 25% | 0.1% | 1 |
9 | STATE MAT MODIFICAT ELECT ION LASER BEA | 0 | 17% | 0.1% | 1 |
10 | PLASMA CONVERS ENERGY | 0 | 14% | 0.1% | 1 |
Related classes at same level (level 1) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000136847 | ELECTRON CYCLOTRON RESONANCE ION SOURCE//ECR ION SOURCE//ECRIS |
2 | 0.0000131642 | SURFACE WAVE PLASMA//GRP ESPE OSCOPIA PLASMAS//GRP PHYS PLASMAS |
3 | 0.0000123660 | LOW INDUCTANCE ANTENNA//LOW DAMAGE PROCESS//INDUCTIVELY COUPLED PLASMA |
4 | 0.0000117819 | SPACE PLASMA POWER PROP GRP//SPACE PLASMA POWER PROP//HELICON WAVE |
5 | 0.0000095284 | ELECT DEVICES MAT TECHNOL//SIO2 ETCHING//PLASMA ETCHING |
6 | 0.0000083525 | DOUBLE PLASMA DEVICE//MULTIPLE DOUBLE LAYERS//GRID BIAS METHOD |
7 | 0.0000083193 | CHEMICAL DRY ETCHING//PLASMA NANOTECHNOL PLANT//AFTER CORROSION |
8 | 0.0000079160 | ELECTRON PLASMA OSCILLATION//RAMAN REGIME//TEMPAKU |
9 | 0.0000075678 | PLASMA CONFINEMENT SPATIALLY PERIODIC FIELD//MAGNETIC CUSP//MECH SYST ENGN COURSE |
10 | 0.0000071691 | SIH2//SIH3//SILANE PLASMA |