Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
11688 | 898 | 16.0 | 53% |
Classes in level above (level 2) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
2430 | 3649 | INTENSE PULSED ION BEAM//HIGH CURRENT PULSED ELECTRON BEAM//HIGH INTENSITY PULSED ION BEAM |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | INTENSE PULSED ION BEAM | Author keyword | 41 | 81% | 3% | 25 |
2 | HIGH CURRENT PULSED ELECTRON BEAM | Author keyword | 38 | 66% | 4% | 35 |
3 | HIGH INTENSITY PULSED ION BEAM | Author keyword | 34 | 65% | 4% | 33 |
4 | ION BEAM EVAPORATION | Author keyword | 32 | 88% | 2% | 15 |
5 | HIGH CURRENT PULSED ELECTRON BEAM HCPEB | Author keyword | 15 | 63% | 2% | 15 |
6 | INTENSE PULSED ION BEAMS | Author keyword | 14 | 100% | 1% | 7 |
7 | COMPRESSION PLASMA FLOW | Author keyword | 8 | 70% | 1% | 7 |
8 | HIGH INTENSITY PULSED ION BEAMS | Author keyword | 8 | 100% | 1% | 5 |
9 | SELF MAGNETICALLY INSULATED DIODE | Author keyword | 8 | 100% | 1% | 5 |
10 | COMPRESSION PLASMA FLOWS | Author keyword | 7 | 67% | 1% | 6 |
Web of Science journal categories |
Author Key Words |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | D2 STEEL | 15 | 56% | 2% | 18 |
2 | POWER ION BEAM | 11 | 100% | 1% | 6 |
3 | MAGNETICALLY INSULATED DIODE | 8 | 75% | 1% | 6 |
4 | INTENSITY PULSED ION | 6 | 80% | 0% | 4 |
5 | AMORPHOUS LAYER FORMATION | 6 | 100% | 0% | 4 |
6 | PHASE FORMATIONS | 5 | 63% | 1% | 5 |
7 | INTENSE ION BEAM | 4 | 75% | 0% | 3 |
8 | CURRENT ELECTRON BEAMS | 4 | 56% | 1% | 5 |
9 | FOCUS DIODE | 3 | 100% | 0% | 3 |
10 | HCPEB | 3 | 100% | 0% | 3 |
Journals |
Reviews |
Title | Publ. year | Cit. | Active references |
% act. ref. to same field |
---|---|---|---|---|
Materials modification using intense ion beams | 2004 | 42 | 66 | 80% |
Modification of material properties and coating deposition using plasma jets | 2005 | 21 | 31 | 55% |
METASTABLE STATES AND STRUCTURAL PHASE-CHANGES IN METALS AND ALLOYS EXPOSED TO HIGH-POWER PULSED ION-BEAMS | 1990 | 39 | 18 | 83% |
Metal modification by high-power pulsed particle beams | 1999 | 9 | 57 | 84% |
Nanostructure Formations and Improvement in Corrosion Resistance of Steels by Means of Pulsed Electron Beam Surface Treatment | 2013 | 1 | 42 | 55% |
MODIFICATION OF METAL-SURFACE LAYER PROPERTIES USING PULSED ELECTRON-BEAMS | 1994 | 20 | 25 | 44% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | SHANGHAI ENGN MG MAT PLICAT | 5 | 41% | 1.0% | 9 |
2 | BEAM TECHNOL | 4 | 30% | 1.2% | 11 |
3 | MINIST EDUC MAT MODIFICAT LASER ION ELE ON BE | 3 | 100% | 0.3% | 3 |
4 | EXTREME ENERGY DENS | 3 | 12% | 2.9% | 26 |
5 | LETAM | 3 | 11% | 2.7% | 24 |
6 | UMR 7078 | 2 | 10% | 2.0% | 18 |
7 | CNRS 3143 | 1 | 38% | 0.3% | 3 |
8 | NUCL METHODS MAT ENGN | 1 | 38% | 0.3% | 3 |
9 | STATE MAT MODIFICAT ION LASER ELECT BEA | 1 | 100% | 0.2% | 2 |
10 | PRECIS MFG | 1 | 16% | 0.8% | 7 |
Related classes at same level (level 1) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000174402 | INFNSEZ LECCE//FAST SIGNALS//FOCUSED ION BEAM IMAGING |
2 | 0.0000121015 | PLASMA OPENING SWITCH//MAGNETICALLY INSULATED TRANSMISSION LINE MITL//PINCHED BEAM DIODES |
3 | 0.0000071785 | IMPULSE PLASMA DEPOSITION//IPD METHOD//PULSED HIGH ENERGY DENSITY PLASMA |
4 | 0.0000063466 | STRESS STRAINED STATE//STRESS STRUCTURAL INHOMOGENEITY//STATE ENGN |
5 | 0.0000057067 | RADIAT BEAM MAT ENGN//TI AL ZR ALLOY//ION PHYS MAT |
6 | 0.0000049060 | COAXIAL VIRCATOR//VIRCATOR//VIRTUAL CATHODE OSCILLATOR |
7 | 0.0000044624 | DYNAMIC THEORY//CONTROLLING WAVE PROCESS//CRYSTON |
8 | 0.0000043677 | PLASMA LENS//PLASMA OPTICS//HALL CURRENT ACCELERATOR |
9 | 0.0000041125 | MCA METHOD//METHOD OF MOVABLE CELLULAR AUTOMATA//PHYS STRENGTH MAT MAT SCI |
10 | 0.0000040668 | PARTICLES HIGH ENERGY PHYS//GRANULAR NANOCOMPOSITES//KATEDRA URZADZEN ELEKT TECH WYSOKICH N IEC |