Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
112 | 4214 | 20.0 | 54% |
Classes in level above (level 2) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
252 | 19240 | MICROCRYSTALLINE SILICON//JOURNAL OF NON-CRYSTALLINE SOLIDS//PHOTOVOLTA THIN FILM ELECT |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | STAEBLER WRONSKI EFFECT | Author keyword | 27 | 58% | 1% | 31 |
2 | HYDROGENATED AMORPHOUS SILICON | Author keyword | 18 | 22% | 2% | 73 |
3 | SOLAR CELLS | Journal | 11 | 10% | 2% | 99 |
4 | LIGHT INDUCED ANNEALING | Author keyword | 11 | 100% | 0% | 6 |
5 | DEFECT POOL | Author keyword | 9 | 83% | 0% | 5 |
6 | SEMICONDUCTORS AND SEMIMETALS | Journal | 8 | 22% | 1% | 32 |
7 | A SI H | Author keyword | 6 | 19% | 1% | 30 |
8 | ANNEALING ACTIVATION ENERGY DISTRIBUTION | Author keyword | 6 | 100% | 0% | 4 |
9 | JAPAN ANNUAL REVIEWS IN ELECTRONICS COMPUTERS & TELECOMMUNICATIONS | Journal | 5 | 16% | 1% | 29 |
10 | MAT SEMICOND MET | Address | 5 | 63% | 0% | 5 |
Web of Science journal categories |
Author Key Words |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | A SI H | 114 | 25% | 10% | 401 |
2 | HYDROGENATED AMORPHOUS SILICON | 63 | 17% | 8% | 333 |
3 | INDUCED METASTABLE DEFECTS | 53 | 78% | 1% | 35 |
4 | METASTABLE DEFECTS | 41 | 47% | 2% | 64 |
5 | DANGLING BONDS | 40 | 42% | 2% | 73 |
6 | DISPERSIVE DIFFUSION | 24 | 82% | 0% | 14 |
7 | ALPHA SI H | 24 | 50% | 1% | 34 |
8 | CONDUCTIVITY CHANGES | 20 | 37% | 1% | 42 |
9 | DEFECT POOL MODEL | 15 | 45% | 1% | 26 |
10 | GAP STATE DISTRIBUTION | 15 | 82% | 0% | 9 |
Journals |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | SOLAR CELLS | 11 | 10% | 2% | 99 |
2 | SEMICONDUCTORS AND SEMIMETALS | 8 | 22% | 1% | 32 |
3 | JAPAN ANNUAL REVIEWS IN ELECTRONICS COMPUTERS & TELECOMMUNICATIONS | 5 | 16% | 1% | 29 |
Reviews |
Title | Publ. year | Cit. | Active references | % act. ref. to same field |
---|---|---|---|---|
LIGHT-INDUCED METASTABLE DEFECTS IN HYDROGENATED AMORPHOUS-SILICON - A SYSTEMATIC STUDY | 1985 | 822 | 72 | 83% |
Development in understanding and controlling the Staebler-Wronski effect in a-Si : H | 2001 | 73 | 78 | 85% |
Diffusion and evolution of hydrogen in hydrogenated amorphous and microcrystalline silicon | 2003 | 56 | 65 | 74% |
Staebler-Wronski effect in hydrogenated amorphous silicon and related alloy films | 2004 | 41 | 75 | 89% |
THE OPTICAL-ABSORPTION EDGE OF A-SI-H | 1984 | 328 | 49 | 71% |
DETAILED INVESTIGATION OF DOPING IN HYDROGENATED AMORPHOUS-SILICON AND GERMANIUM | 1987 | 170 | 69 | 72% |
An empirical density of states and joint density of states analysis of hydrogenated amorphous silicon: a review | 2004 | 16 | 33 | 70% |
Light-induced defect creation under intense pulsed illumination in hydrogenated amorphous silicon | 2009 | 1 | 31 | 87% |
Hydrogen phenomena in hydrogenated amorphous silicon | 1999 | 29 | 81 | 62% |
STRUCTURAL CHARACTERIZATION OF NONCRYSTALLINE SOLIDS AND GLASSES USING SOLID-STATE NMR | 1992 | 215 | 478 | 13% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | MAT SEMICOND MET | 5 | 63% | 0.1% | 5 |
2 | ELECT ENGN SAEKI KU | 2 | 67% | 0.0% | 2 |
3 | ELECT DIGITAL SYST ENGN | 2 | 23% | 0.2% | 7 |
4 | GAS POWER RD | 2 | 43% | 0.1% | 3 |
5 | IMIO PW | 1 | 33% | 0.1% | 3 |
6 | THIN FILM SILICON SOLAR CELLS SUPER | 1 | 16% | 0.1% | 4 |
7 | AG THERMOCHEMIE MIKROKINET | 1 | 50% | 0.0% | 1 |
8 | CNRS UMR 0258 | 1 | 50% | 0.0% | 1 |
9 | ENGN SIST COMP | 1 | 50% | 0.0% | 1 |
10 | FAK NAT MAT WISSEN THERMOCHEM MIKROKINET | 1 | 50% | 0.0% | 1 |
Related classes at same level (level 1) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000228329 | JOINT HIGH TECHNOL//STEADY STATE PHOTOCARRIER GRATING//JOINT HIGHTECHNOL |
2 | 0.0000220884 | GERMANIUM CARBON//A SIGE//GE1 XCX |
3 | 0.0000149898 | SIH2//SIH3//SILANE PLASMA |
4 | 0.0000146410 | A SIH A SIGEH//AMORPHOUS SILICON BASED ALLOY//DIP SCI MAT TERRA |
5 | 0.0000142408 | FLUCTUATION ELECTRON MICROSCOPY//FLUCTUATION MICROSCOPY//REDUCED DENSITY FUNCTION |
6 | 0.0000109749 | ELECT TELECOMMUN COMP//IMAGE ACQUISITION AND REPRESENTATION//MULTISPECTRAL STRUCTURES |
7 | 0.0000105381 | LADDER SILICONE SPIN ON GLASS LS SOG//POLYSILOXENE BASED FILM//SIO2 PATTERN GENERATION |
8 | 0.0000095900 | MICROCRYSTALLINE SILICON//SID PHYS DEVICES//MU C SI H |
9 | 0.0000093712 | FINE GRAIN POLYCRYSTALLINE SI//HYDROGENATED AMORPHOUS SI//BONDING D ORBITALS |
10 | 0.0000093687 | DIFFUSION TEMPERATURE//DEVICE FUNCT SECT//TWO DIMENSIONAL DEVICE SIMULATION |