Class information for:
Level 1: RUN TO RUN CONTROL//IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING//AUTOMATIC VIRTUAL METROLOGY AVM

Basic class information
ID Publications Average number
of references		 Avg. shr. active
ref. in WoS
11034 948 19.6 54%


Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 2)


ID, lev.
above		 Publications Label for level above
1317 8022 ELECT DEVICES MAT TECHNOL//PLASMA ETCHING//SIO2 ETCHING

Terms with highest relevance score


Rank Term Type of term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 RUN TO RUN CONTROL Author keyword 38 51% 6% 54
2 IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING Journal 28 13% 21% 197
3 AUTOMATIC VIRTUAL METROLOGY AVM Author keyword 18 89% 1% 8
4 AVERAGE ADJUSTMENT INTERVAL Author keyword 18 89% 1% 8
5 VIRTUAL METROLOGY Author keyword 17 47% 3% 27
6 VIRTUAL METROLOGY VM Author keyword 14 64% 1% 14
7 RUN TO RUN R2R CONTROL Author keyword 12 75% 1% 9
8 PROCESS ADJUSTMENT Author keyword 9 52% 1% 12
9 EWMA CONTROLLER Author keyword 8 75% 1% 6
10 RUN TO RUN PROCESS CONTROL Author keyword 8 75% 1% 6

Web of Science journal categories

Author Key Words


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class		 LCSH search Wikipedia search
1 RUN TO RUN CONTROL 38 51% 6% 54 Search RUN+TO+RUN+CONTROL Search RUN+TO+RUN+CONTROL
2 AUTOMATIC VIRTUAL METROLOGY AVM 18 89% 1% 8 Search AUTOMATIC+VIRTUAL+METROLOGY+AVM Search AUTOMATIC+VIRTUAL+METROLOGY+AVM
3 AVERAGE ADJUSTMENT INTERVAL 18 89% 1% 8 Search AVERAGE+ADJUSTMENT+INTERVAL Search AVERAGE+ADJUSTMENT+INTERVAL
4 VIRTUAL METROLOGY 17 47% 3% 27 Search VIRTUAL+METROLOGY Search VIRTUAL+METROLOGY
5 VIRTUAL METROLOGY VM 14 64% 1% 14 Search VIRTUAL+METROLOGY+VM Search VIRTUAL+METROLOGY+VM
6 RUN TO RUN R2R CONTROL 12 75% 1% 9 Search RUN+TO+RUN+R2R+CONTROL Search RUN+TO+RUN+R2R+CONTROL
7 PROCESS ADJUSTMENT 9 52% 1% 12 Search PROCESS+ADJUSTMENT Search PROCESS+ADJUSTMENT
8 EWMA CONTROLLER 8 75% 1% 6 Search EWMA+CONTROLLER Search EWMA+CONTROLLER
9 RUN TO RUN PROCESS CONTROL 8 75% 1% 6 Search RUN+TO+RUN+PROCESS+CONTROL Search RUN+TO+RUN+PROCESS+CONTROL
10 RUN TO RUN CONTROLLER 6 80% 0% 4 Search RUN+TO+RUN+CONTROLLER Search RUN+TO+RUN+CONTROLLER

Key Words Plus


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 EWMA CONTROLLER 65 84% 4% 36
2 RUN PROCESS CONTROL 46 78% 3% 31
3 TO RUN CONTROL 28 62% 3% 29
4 METROLOGY DELAY 27 92% 1% 11
5 DOUBLE EWMA CONTROLLER 17 100% 1% 8
6 CATEGORICAL OBSERVATIONS 12 86% 1% 6
7 COMBINING SPC 12 86% 1% 6
8 H 2 WF6 9 83% 1% 5
9 LOW DAMAGE 9 83% 1% 5
10 SEMICONDUCTOR MANUFACTURING PROCESSES 7 50% 1% 10

Journals


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING 28 13% 21% 197

Reviews


Title Publ. year Cit. Active
references		 % act. ref.
to same field
Automatic control in microelectronics manufacturing: Practices, challenges, and possibilities 2000 122 59 58%
Run-to-run process control: Literature review and extensions 1997 100 14 50%
Estimation and Control in Semiconductor Etch: Practice and Possibilities 2010 7 93 73%
Run-to-run control and state estimation in high-mix semiconductor manufacturing 2007 9 5 80%
A Literature Review on Sampling Techniques in Semiconductor Manufacturing 2013 2 15 33%
A review of SiC reactive ion etching in fluorinated plasmas 1997 79 84 21%
Data analytics and stochastic modeling in a semiconductor fab 2010 3 3 33%

Address terms


Rank Address term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 NISHI YODOGAWA KU 4 75% 0.3% 3
2 ENGN ADV ELECT MAT PROC 3 100% 0.3% 3
3 MFG INFORMAT SYST 3 15% 1.8% 17
4 MICROMECHATRON 2 38% 0.5% 5
5 ADV MICROELECT TECHNOL 2 67% 0.2% 2
6 AUTOMATED PRECIS MFG 2 67% 0.2% 2
7 CIMOS 2 67% 0.2% 2
8 IND MANAGEMENT BUSINESS ADM 2 43% 0.3% 3
9 LARGE SCALE INTEGRAT 1 100% 0.2% 2
10 CONTROL GUIDANCE TECHNOL 1 33% 0.3% 3

Related classes at same level (level 1)


Rank Relatedness score Related classes
1 0.0000094435 RAPID THERMAL PROCESSING RTP//RAPID THERMAL PROCESSING//CTOD FRACTURE TOUGHNESS TESTING
2 0.0000077114 SECCIO INTELLIGENCIA ARTIFICIAL//INTEGRATED SENSORY INTELLIGENT SYSTEM//ALTANA CHAIR BIOINFORMAT INFORMAT MIN
3 0.0000073044 ELLIPSOIDAL TECHNIQUE//DESIGN CENTERING//PARAMETRIC YIELD
4 0.0000072876 ELECT DEVICES MAT TECHNOL//SIO2 ETCHING//PLASMA ETCHING
5 0.0000071322 AVERAGE RUN LENGTH//STATISTICAL PROCESS CONTROL//CONTROL CHARTS
6 0.0000050089 VACUUM TECHNOL//ACTIVE PLASMA RESONANCE SPECTROSCOPY//CUTOFF PROBE
7 0.0000049769 CHEMICAL DRY ETCHING//PLASMA NANOTECHNOL PLANT//AFTER CORROSION
8 0.0000046448 WET ETCHING OF GLASS//DEEP GLASS ETCHING//TECH SUPPORT MACHINERY MET IND
9 0.0000046032 OPTICAL SCATTEROMETRY//DIMENSIONAL STANDARDS//LINEWIDTH MONITORING
10 0.0000044817 WAFER FABRICATION//IND ENGN SYST MANAGEMENT//FUZZY BACK PROPAGATION NETWORK