Class information for:
Level 1: PERFLUORINATED CARBOXYLATES//COPPER CVD//IR AND NMR

Basic class information
ID Publications Average number
of references		 Avg. shr. active
ref. in WoS
10936 954 27.2 64%


Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 2)


ID, lev.
above		 Publications Label for level above
1854 5551 ATOMIC LAYER DEPOSITION//CHEMICAL VAPOR DEPOSITION//MOLECULAR LAYER DEPOSITION MLD

Terms with highest relevance score


Rank Term Type of term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 PERFLUORINATED CARBOXYLATES Author keyword 11 65% 1% 11
2 COPPER CVD Author keyword 6 71% 1% 5
3 IR AND NMR Author keyword 6 71% 1% 5
4 ZENTRUM MIKROTECHNOL Address 6 41% 1% 11
5 COPPER FILMS Author keyword 4 30% 1% 12
6 CU CVD Author keyword 4 75% 0% 3
7 LOW INDEX SINGLE CRYSTAL SI SURFACES Author keyword 3 100% 0% 3
8 CNRS 7071 Address 3 60% 0% 3
9 AGI COMPLEXES Author keyword 2 25% 1% 8
10 AUI COMPLEXES Author keyword 2 67% 0% 2

Web of Science journal categories

Author Key Words


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class		 LCSH search Wikipedia search
1 PERFLUORINATED CARBOXYLATES 11 65% 1% 11 Search PERFLUORINATED+CARBOXYLATES Search PERFLUORINATED+CARBOXYLATES
2 COPPER CVD 6 71% 1% 5 Search COPPER+CVD Search COPPER+CVD
3 IR AND NMR 6 71% 1% 5 Search IR+AND+NMR Search IR+AND+NMR
4 COPPER FILMS 4 30% 1% 12 Search COPPER+FILMS Search COPPER+FILMS
5 CU CVD 4 75% 0% 3 Search CU+CVD Search CU+CVD
6 LOW INDEX SINGLE CRYSTAL SI SURFACES 3 100% 0% 3 Search LOW+INDEX+SINGLE+CRYSTAL+SI+SURFACES Search LOW+INDEX+SINGLE+CRYSTAL+SI+SURFACES
7 AGI COMPLEXES 2 25% 1% 8 Search AGI+COMPLEXES Search AGI+COMPLEXES
8 AUI COMPLEXES 2 67% 0% 2 Search AUI+COMPLEXES Search AUI+COMPLEXES
9 PERFLUORINATED CARBOXYLATE 2 67% 0% 2 Search PERFLUORINATED+CARBOXYLATE Search PERFLUORINATED+CARBOXYLATE
10 DIRECT LIQUID INJECTION 2 31% 1% 5 Search DIRECT+LIQUID+INJECTION Search DIRECT+LIQUID+INJECTION

Key Words Plus


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 HEXAFLUOROACETYLACETONATE 58 60% 7% 64
2 PERFLUORINATED CARBOXYLATES 27 71% 2% 22
3 VINYLTRIMETHYLSILANE 24 60% 3% 26
4 TRIMETHYLVINYLSILANE 23 70% 2% 19
5 DEVICE QUALITY COPPER 20 100% 1% 9
6 HELIUM CARRIER GAS 14 100% 1% 7
7 HEXAFLUOROACETYLACETONATE COMPLEXES 13 80% 1% 8
8 HFACCU1 5 COD 12 86% 1% 6
9 ALD PROCESSES 11 67% 1% 10
10 CUDPM2 11 78% 1% 7

Journals

Reviews


Title Publ. year Cit. Active references % act. ref.
to same field
Current trends in patterning with copper 2002 88 134 59%
Copper(I), silver(I) and gold(I) carboxylate complexes as precursors in chemical vapour deposition of thin metallic films 2005 89 79 52%
Why is coordination chemistry stretching the limits of micro-electronics technology? 1998 96 38 71%
Precursors and chemistry for the atomic layer deposition of metallic first row transition metal films 2013 13 99 40%
CHEMICAL-VAPOR-DEPOSITION OF COPPER FROM (HFAC)CUL COMPOUNDS 1995 67 53 74%
FTIR STUDIES OF THE ADSORPTION/DESORPTION BEHAVIOR OF COPPER CHEMICAL-VAPOR-DEPOSITION PRECURSORS ON SILICA .1. BIS(1,1,1,5,5,5-HEXAFLUOROACETYLACETONATO)COPPER(II) 1994 30 42 83%
Metal ALD and pulsed CVD: Fundamental reactions and links with solution chemistry 2013 8 161 21%
Preparation of thin copper films from the vapour phase of volatile copper(I) and copper(II) derivatives by the CVD method 2000 6 287 61%
CHEMICAL-VAPOR-DEPOSITION OF METALS .2. OVERVIEW OF SELECTIVE CVD OF METALS 1995 18 48 44%
SELECTIVE METALLIZATION BY CHEMICAL-VAPOR-DEPOSITION 1993 68 83 28%

Address terms


Rank Address term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 ZENTRUM MIKROTECHNOL 6 41% 1.2% 11
2 CNRS 7071 3 60% 0.3% 3
3 LEHRSTUHL MIKROTECHNOL 2 67% 0.2% 2
4 PHYS 1SC25 1 100% 0.2% 2
5 SCI MAT ENGN 1 16% 0.7% 7
6 ADV MAT PROCLAMP 1 50% 0.1% 1
7 CHEM CRYSTALLOG SERV 1 50% 0.1% 1
8 CHEM SCI MAT SCI ENGN 1 50% 0.1% 1
9 CHEM TECHNOL MAT CHARACTERIZAT 1 50% 0.1% 1
10 DTGSI 1 50% 0.1% 1

Related classes at same level (level 1)


Rank Relatedness score Related classes
1 0.0000195350 NIPF34//SI3H8//VOLATILE COMPLEXES
2 0.0000157176 DIFFUSION BARRIER//CU METALLIZATION//TANTALUM NITRIDE
3 0.0000148018 IRIDIUM COATING//IRIDIUM COATINGS//IR COATING
4 0.0000120446 INDUCTIVELY COUPLED PLASMA REACTIVE ION ETCHING//TI HARD MASK//CL 2 BASED PLASMA
5 0.0000113062 SUPERCRITICAL FLUID DEPOSITION//TBP HNO3 COMPLEX//SUPERCRITICAL DEPOSITION
6 0.0000111161 LASER MICRO CLADDING//FREEFORM FABRICAT S//DIMETHYLALUMINUM HYDRIDE
7 0.0000095850 LANTHANIDE BETA DIKETONATES//BETA DIKETONATES//BETA DIKETONATE CHELATES
8 0.0000088255 ELECTROLESS COPPER PLATING//ELECTROLESS COPPER DEPOSITION//ELECTROLESS DEPOSITION
9 0.0000087017 ATOMIC LAYER DEPOSITION//MOLECULAR LAYER DEPOSITION MLD//MOLECULAR LAYER DEPOSITION
10 0.0000086826 CVD W//FEATURE SCALE MODEL//FOCUS NEW YORK