Class information for:
Level 1: ADSORPTIVE STRIPPING TENSAMMETRY//TENSAMMETRY//INDIRECT TENSAMMETRIC METHOD

Basic class information
ID Publications Average number
of references		 Avg. shr. active
ref. in WoS
10910 956 27.0 42%


Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 2)


ID, lev.
above		 Publications Label for level above
883 10778 ANODIC STRIPPING VOLTAMMETRY//STRIPPING VOLTAMMETRY//ELECTROANALYSIS

Terms with highest relevance score


Rank Term Type of term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 ADSORPTIVE STRIPPING TENSAMMETRY Author keyword 23 100% 1% 10
2 TENSAMMETRY Author keyword 14 59% 2% 16
3 INDIRECT TENSAMMETRIC METHOD Author keyword 8 100% 1% 5
4 BISMUTH ACTIVE SUBSTANCES Author keyword 3 100% 0% 3
5 CONTROLLED GROWTH MERCURY ELECTRODE Author keyword 3 60% 0% 3
6 ADSORPTIVE STRIPPING INDIRECT TENSAMMETRIC TECHNIQUE Author keyword 1 100% 0% 2
7 CURRENT TIME CURVE Author keyword 1 100% 0% 2
8 ELECTROCAPILLARY MEASUREMENT Author keyword 1 100% 0% 2
9 INDIRECT TENSAMMETRIC TECHNIQUE Author keyword 1 100% 0% 2
10 NUCL CHEM PL PHYS CHEM 4 Address 1 50% 0% 2

Web of Science journal categories

Author Key Words


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class		 LCSH search Wikipedia search
1 ADSORPTIVE STRIPPING TENSAMMETRY 23 100% 1% 10 Search ADSORPTIVE+STRIPPING+TENSAMMETRY Search ADSORPTIVE+STRIPPING+TENSAMMETRY
2 TENSAMMETRY 14 59% 2% 16 Search TENSAMMETRY Search TENSAMMETRY
3 INDIRECT TENSAMMETRIC METHOD 8 100% 1% 5 Search INDIRECT+TENSAMMETRIC+METHOD Search INDIRECT+TENSAMMETRIC+METHOD
4 BISMUTH ACTIVE SUBSTANCES 3 100% 0% 3 Search BISMUTH+ACTIVE+SUBSTANCES Search BISMUTH+ACTIVE+SUBSTANCES
5 CONTROLLED GROWTH MERCURY ELECTRODE 3 60% 0% 3 Search CONTROLLED+GROWTH+MERCURY+ELECTRODE Search CONTROLLED+GROWTH+MERCURY+ELECTRODE
6 ADSORPTIVE STRIPPING INDIRECT TENSAMMETRIC TECHNIQUE 1 100% 0% 2 Search ADSORPTIVE+STRIPPING+INDIRECT+TENSAMMETRIC+TECHNIQUE Search ADSORPTIVE+STRIPPING+INDIRECT+TENSAMMETRIC+TECHNIQUE
7 CURRENT TIME CURVE 1 100% 0% 2 Search CURRENT+TIME+CURVE Search CURRENT+TIME+CURVE
8 ELECTROCAPILLARY MEASUREMENT 1 100% 0% 2 Search ELECTROCAPILLARY+MEASUREMENT Search ELECTROCAPILLARY+MEASUREMENT
9 INDIRECT TENSAMMETRIC TECHNIQUE 1 100% 0% 2 Search INDIRECT+TENSAMMETRIC+TECHNIQUE Search INDIRECT+TENSAMMETRIC+TECHNIQUE
10 OXYETHYLATED ALKYLPHENOLS 1 100% 0% 2 Search OXYETHYLATED+ALKYLPHENOLS Search OXYETHYLATED+ALKYLPHENOLS

Key Words Plus


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 AVAILABLE OXYETHYLATED ALCOHOLS 18 83% 1% 10
2 ANALYTICAL SIGNAL 15 88% 1% 7
3 INDIRECT TENSAMMETRIC METHOD 10 63% 1% 10
4 ADSORPTIVE STRIPPING TENSAMMETRY 8 75% 1% 6
5 POTENTIAL ELECTROCHEMICAL DETECTOR 8 100% 1% 5
6 PROCEDURE WICKBOLD 8 100% 1% 5
7 DUAL ELECTROCHEMICAL DETECTION 4 67% 0% 4
8 ELECTROCAPILLARY MEASUREMENTS 4 75% 0% 3
9 FLOW STREAMS 3 57% 0% 4
10 MODIFIED DRAGENDORFF REAGENT 3 100% 0% 3

Journals

Reviews


Title Publ. year Cit. Active references % act. ref.
to same field
COMPOSITE ELECTRODES FOR ELECTROANALYSIS - PRINCIPLES AND APPLICATIONS 1990 108 59 31%
TENSAMMETRIC TECHNIQUES FOR ELECTROANALYSIS 1993 9 49 65%
PROGRESS IN SENSOR ARRAY RESEARCH 1993 21 64 33%
WALL-JET ELECTRODE IN CONTINUOUS MONITORING VOLTAMMETRY 1983 82 2 100%
ELECTROANALYTICAL VOLTAMMETRY IN FLOWING SOLUTIONS 1986 93 196 44%
Microcells for voltammetry and stripping voltammetry 1997 21 57 28%
LIQUID-CHROMATOGRAPHY ELECTROCHEMISTRY - THIN-LAYER MULTIPLE ELECTRODE DETECTION 1982 133 13 85%
SERIES DUAL-ELECTRODE DETECTOR FOR LIQUID-CHROMATOGRAPHY ELECTROCHEMISTRY 1982 93 3 100%
CHRONOAMPEROMETRIC RESPONSE AT CARBON-BASED COMPOSITE ELECTRODES 1983 77 3 67%
USE OF MERCURY DROP ELECTRODES FOR POLAROGRAPHIC MEASUREMENTS IN FLOWING SOLUTIONS 1989 6 52 73%

Address terms


Rank Address term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class
1 NUCL CHEM PL PHYS CHEM 4 1 50% 0.2% 2
2 PFSG 1 50% 0.2% 2
3 ANALYT CHEM ALBERTOV 2030 1 50% 0.1% 1
4 ANGEW PHYS CHEM 4 1 50% 0.1% 1
5 EXPOSURE CINCINNATI 1 50% 0.1% 1
6 RE STOFFANALYT 1 50% 0.1% 1
7 REG PHYSICOCHEM STRUCT 0 33% 0.1% 1
8 ADVANCE TECHNOL 0 25% 0.1% 1
9 ULTATEA CHIM IND 0 20% 0.1% 1
10 ELE OCHIM ANALYT PL 0 17% 0.1% 1

Related classes at same level (level 1)


Rank Relatedness score Related classes
1 0.0000159933 SPHERICAL ELECTRODES//CYCLIC RECIPROCAL DERIVATIVE CHRONOPOTENTIOMETRY//SQUARE WAVE VOLTAMMETRY
2 0.0000148507 UNESCO ENVIRONM ELE OCHEM//SILVER AMALGAM FILM ELECTRODE//POLISHED SILVER SOLID AMALGAM ELECTRODE
3 0.0000137786 STEEL PRODUCTION WORKERS//POTENTIOMETRIC STRIPPING ANALYSIS//MARINE ENVIRONMENTAL MATRICES
4 0.0000127269 COMPUTATIONAL ELECTROCHEMISTRY//MATH COMP MODELLING//STEADY STATE VOLTAMMETRY
5 0.0000121215 ELECTROCHEMICAL PRETREATMENT//ELECTROACTIVE AREA//ELECTRODE REACTIVITY
6 0.0000108793 IMMOBILIZED CARBOWAX 20M//SLURRY PACKING//OPEN TUBULAR COLUMNS
7 0.0000095001 DYNAMIC MECHANICAL THERMO ANALYSIS//FILM COATS//EUDRAGIT R L 30 D 55
8 0.0000088511 DEMENTIA SERV//FIRST EPISODE NEUROLEPTIC NAIVE//SECONDARY FRACTIONATION
9 0.0000085317 ADSORPTIVE STRIPPING VOLTAMMETRY//ADSORPTION VOLTAMMETRY//ALIZARIN COMPLEXON
10 0.0000075993 LIMIT DILUTION METHOD//NISHINA ACCLERATOR BASED SCI//STANDARD ADDITION TECHNIQUE