Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
10366 | 1004 | 26.0 | 55% |
Classes in level above (level 2) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
142 | 22391 | JOURNAL OF ANALYTICAL ATOMIC SPECTROMETRY//SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY//ELECTROTHERMAL VAPORIZATION |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | MICROWAVE INDUCED PLASMA | Author keyword | 75 | 62% | 8% | 77 |
2 | HIGH POWER NITROGEN MICROWAVE INDUCED PLASMA | Author keyword | 41 | 100% | 1% | 15 |
3 | OKAMOTO CAVITY | Author keyword | 35 | 81% | 2% | 21 |
4 | ATOMIC EMISSION DETECTION | Author keyword | 30 | 55% | 4% | 37 |
5 | MICROWAVE PLASMA TORCH | Author keyword | 24 | 57% | 3% | 29 |
6 | ATOMIC EMISSION SPECTROMETRY | Author keyword | 24 | 24% | 9% | 88 |
7 | HYDRIDE GENERATION METHOD | Author keyword | 23 | 100% | 1% | 10 |
8 | CAPACITIVELY COUPLED MICROWAVE PLASMA | Author keyword | 11 | 100% | 1% | 6 |
9 | COMPOUND INDEPENDENT CALIBRATION | Author keyword | 8 | 70% | 1% | 7 |
10 | FURNACE ATOMIZATION PLASMA EMISSION SPECTROMETRY | Author keyword | 8 | 75% | 1% | 6 |
Web of Science journal categories |
Author Key Words |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | FAPES | 93 | 100% | 3% | 28 |
2 | ELEMENT SELECTIVE DETECTOR | 47 | 81% | 3% | 29 |
3 | INDUCED HELIUM PLASMA | 34 | 93% | 1% | 13 |
4 | MICROWAVE INDUCED PLASMA | 34 | 32% | 9% | 87 |
5 | MOLECULAR FORMULA DETERMINATION | 27 | 92% | 1% | 11 |
6 | TM010 CAVITY | 23 | 100% | 1% | 10 |
7 | TOROIDAL ARGON | 20 | 100% | 1% | 9 |
8 | TANGENTIAL FLOW TORCH | 15 | 88% | 1% | 7 |
9 | SURFATRON | 14 | 43% | 3% | 26 |
10 | EXCITATION SOURCE | 12 | 50% | 2% | 17 |
Journals |
Reviews |
Title | Publ. year | Cit. | Active references | % act. ref. to same field |
---|---|---|---|---|
ELEMENT-SPECIFIC CHROMATOGRAPHIC DETECTION BY ATOMIC-ABSORPTION, PLASMA-ATOMIC EMISSION AND PLASMA-MASS SPECTROMETRY | 1995 | 78 | 80 | 49% |
Development and investigation of microwave plasma techniques in analytical atomic spectrometry | 1997 | 39 | 118 | 81% |
Recent advances in microwave induced plasma atomic emission spectrometry with Okamoto-cavity | 2005 | 7 | 30 | 87% |
Microwave plasma torch analytical atomic spectrometry | 2000 | 15 | 92 | 80% |
Some unique properties of gas chromatography coupled with atomic-emission detection | 2002 | 28 | 90 | 49% |
Recent developments in instrumentation of microwave plasma sources for optical emission and mass spectrometry: Tutorial review | 2013 | 7 | 109 | 47% |
A review of microwave plasma sources in atomic emission spectrometry: Literature from 1985 to the present | 1997 | 19 | 278 | 77% |
DIAGNOSIS, PREVENTION AND TREATMENT OF FATTY SPEW IN THE TANNERY | 2015 | 0 | 1 | 100% |
Speciation analysis by gas chromatography with plasma source spectrometric detection | 1997 | 57 | 179 | 32% |
Microwave-induced plasma-optical emission spectrometry - fundamental aspects and applications in metal speciation analysis | 2000 | 19 | 82 | 49% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | JILIN PROV ENGN TECHNOL SPE AL ANALYT | 1 | 38% | 0.3% | 3 |
2 | EDGEWOOD S | 1 | 100% | 0.2% | 2 |
3 | ELECT MAGNETISM ELECT | 1 | 100% | 0.2% | 2 |
4 | DEV OPTOELECT BUCHA T | 1 | 40% | 0.2% | 2 |
5 | LEACM | 1 | 33% | 0.2% | 2 |
6 | CHAIRE MEDICAMENT GROSSESSE | 1 | 50% | 0.1% | 1 |
7 | CHEM MINERAL ANALYT CHEM | 1 | 50% | 0.1% | 1 |
8 | CHEMO BIOSENSOR EV | 1 | 50% | 0.1% | 1 |
9 | COL CHEM | 1 | 50% | 0.1% | 1 |
10 | FAK ELEKROTECH INFORMAT TECH | 1 | 50% | 0.1% | 1 |
Related classes at same level (level 1) |