Class information for: |
Basic class information |
| ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
|---|---|---|---|
| 10020 | 1035 | 19.3 | 63% |
Classes in level above (level 2) |
| ID, lev. above |
Publications | Label for level above |
|---|---|---|
| 1859 | 5530 | NANOIMPRINT//NANOIMPRINT LITHOGRAPHY//UV NANOIMPRINT |
Terms with highest relevance score |
| Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
|---|---|---|---|---|---|---|
| 1 | SU 8 | Author keyword | 21 | 17% | 11% | 113 |
| 2 | ZNCL2 NACL KCL | Author keyword | 8 | 100% | 0% | 5 |
| 3 | DEVICE TECHNOL GRP | Address | 6 | 50% | 1% | 8 |
| 4 | MIKROSTRUKTURTECH | Address | 5 | 20% | 2% | 22 |
| 5 | KMPR | Author keyword | 5 | 63% | 0% | 5 |
| 6 | DMT IMS | Address | 4 | 75% | 0% | 3 |
| 7 | PLICAT MICRO ENGN | Address | 4 | 75% | 0% | 3 |
| 8 | SU 8 REMOVAL | Author keyword | 4 | 75% | 0% | 3 |
| 9 | IMMR | Address | 4 | 56% | 0% | 5 |
| 10 | DEEP X RAY LITHOGRAPHY | Author keyword | 4 | 22% | 1% | 15 |
Web of Science journal categories |
Author Key Words |
| Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
LCSH search | Wikipedia search |
|---|---|---|---|---|---|---|---|
| 1 | SU 8 | 21 | 17% | 11% | 113 | Search SU+8 | Search SU+8 |
| 2 | ZNCL2 NACL KCL | 8 | 100% | 0% | 5 | Search ZNCL2+NACL+KCL | Search ZNCL2+NACL+KCL |
| 3 | KMPR | 5 | 63% | 0% | 5 | Search KMPR | Search KMPR |
| 4 | SU 8 REMOVAL | 4 | 75% | 0% | 3 | Search SU+8+REMOVAL | Search SU+8+REMOVAL |
| 5 | DEEP X RAY LITHOGRAPHY | 4 | 22% | 1% | 15 | Search DEEP+X+RAY+LITHOGRAPHY | Search DEEP+X+RAY+LITHOGRAPHY |
| 6 | CONFORMAL MASK | 3 | 100% | 0% | 3 | Search CONFORMAL+MASK | Search CONFORMAL+MASK |
| 7 | SPACE TO FEATURE RATIO | 2 | 67% | 0% | 2 | Search SPACE+TO+FEATURE+RATIO | Search SPACE+TO+FEATURE+RATIO |
| 8 | UV LIGA | 2 | 15% | 1% | 12 | Search UV+LIGA | Search UV+LIGA |
| 9 | SU 8 PHOTORESIST | 2 | 16% | 1% | 11 | Search SU+8+PHOTORESIST | Search SU+8+PHOTORESIST |
| 10 | SU 8 RESIST | 2 | 27% | 1% | 6 | Search SU+8+RESIST | Search SU+8+RESIST |
Key Words Plus |
| Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
|---|---|---|---|---|---|
| 1 | SU 8 | 34 | 26% | 11% | 113 |
| 2 | PHOTORESIST | 29 | 16% | 16% | 161 |
| 3 | EMBEDDED MICRO CHANNELS | 21 | 73% | 2% | 16 |
| 4 | ULTRATHICK | 17 | 46% | 3% | 28 |
| 5 | UV LITHOGRAPHY | 15 | 42% | 3% | 28 |
| 6 | UV PHOTORESIST | 15 | 71% | 1% | 12 |
| 7 | HIGH ASPECT RATIO | 12 | 15% | 8% | 78 |
| 8 | SU 8 PHOTORESIST | 11 | 39% | 2% | 22 |
| 9 | X RAY LITHOGRAPHY | 10 | 14% | 6% | 67 |
| 10 | SACRIFICIAL MATERIAL | 9 | 67% | 1% | 8 |
Journals |
Reviews |
| Title | Publ. year | Cit. | Active references | % act. ref. to same field |
|---|---|---|---|---|
| SU-8: a photoresist for high-aspect-ratio and 3D submicron lithography | 2007 | 178 | 135 | 41% |
| Innovative SU-8 Lithography Techniques and Their Applications | 2015 | 1 | 33 | 55% |
| SU-8 as a structural material for labs-on-chips and microelectromechanical systems | 2007 | 97 | 89 | 53% |
| UV-LIGA: From Development to Commercialization | 2014 | 2 | 4 | 50% |
| Applications of LIGA technology to precision manufacturing of high-aspect-ratio micro-components and -systems: a review | 2004 | 107 | 60 | 30% |
| Lab-on-chip technologies: making a microfluidic network and coupling it into a complete microsystem - a review | 2007 | 143 | 176 | 13% |
| Microsystems in medicine | 1998 | 9 | 4 | 75% |
| Microfabrication using synchrotron radiation | 1998 | 46 | 25 | 32% |
| Recent developments in polymer MEMS | 2007 | 155 | 74 | 4% |
| MICRO-ELECTRO-MECHANICAL SYSTEMS (MEMS) - TECHNOLOGY FOR THE 21ST CENTURY | 2014 | 0 | 61 | 16% |
Address terms |
| Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
|---|---|---|---|---|---|
| 1 | DEVICE TECHNOL GRP | 6 | 50% | 0.8% | 8 |
| 2 | MIKROSTRUKTURTECH | 5 | 20% | 2.1% | 22 |
| 3 | DMT IMS | 4 | 75% | 0.3% | 3 |
| 4 | PLICAT MICRO ENGN | 4 | 75% | 0.3% | 3 |
| 5 | IMMR | 4 | 56% | 0.5% | 5 |
| 6 | MICROSTRUCT GRP | 3 | 42% | 0.5% | 5 |
| 7 | CHEM MAT PROC MODELING | 2 | 67% | 0.2% | 2 |
| 8 | NANO ELECT THIN FILM | 2 | 67% | 0.2% | 2 |
| 9 | MIKROSTRUKT TECH | 1 | 31% | 0.4% | 4 |
| 10 | CNR INORGAN METHODOL PLASMAS | 1 | 100% | 0.2% | 2 |
Related classes at same level (level 1) |
| Rank | Relatedness score | Related classes |
|---|---|---|
| 1 | 0.0000257783 | LASER SCAN LITHOGRAPHY//ADV SCI TECHNOL IND//WORM INJECTION MOLDING |
| 2 | 0.0000248442 | PYROLYZED POLYMER//CARBON MICROELECTROMECHANICAL SYSTEMS C MEMS//CARBON MEMS |
| 3 | 0.0000099563 | BIONEM BIO NANO ENGN TECHNOL MED//SOFT MATTER STRUCT GRP ID13//FLUIDIC INTERCONNECT |
| 4 | 0.0000096032 | STENCIL LITHOGRAPHY//STRESS INDUCED DEFORMATION//RESIST SPRAY COATING |
| 5 | 0.0000087548 | MICROLENS ARRAY//MICROLENS//MICROLENSES |
| 6 | 0.0000085383 | PROTON BEAM WRITING//ION BEAM PLICAT//PROBE FORMING SYSTEM |
| 7 | 0.0000078704 | BIOMACHINING//MATRIX EXPOSURE//LIGHT VALVE DISPLAYS |
| 8 | 0.0000078119 | MICROCHIP ELECTROPHORESIS//MICROCHIP//MICROCHIP CAPILLARY ELECTROPHORESIS |
| 9 | 0.0000077026 | LEADING EDGE TECHNOL DEV HEADQUARTERS//MAT IMF III//AL GE |
| 10 | 0.0000073720 | HYDROGEN SILSESQUIOXANE//HSQ//HSQ RESIST |